Synthesis of advanced materials by pulsed-laser deposition

Ionela Vrejoiu; Dan Gheorghita Matei; Johannes David Pedarnig; Dieter Bauerle; Cornel Ghica; Maria Dinescu

doi:10.1117/12.588550

12 April 2005 Synthesis of advanced materials by pulsed-laser deposition

Ionela Vrejoiu, Dan Gheorghita Matei, Johannes David Pedarnig, Dieter Bauerle, Cornel Ghica, Maria Dinescu

Author Affiliations +

Proceedings Volume 5713, Photon Processing in Microelectronics and Photonics IV; (2005) https://doi.org/10.1117/12.588550
Event: Lasers and Applications in Science and Engineering, 2005, San Jose, California, United States

Abstract

Advanced thin film materials with giant dielectric permittivities up to ≈ 10000 were produced by pulsed-laser deposition. Composite targets of barium titanate (BaTiO₃) and polytetrafluorethylene (PTFE) were ablated with 248 nm KrF-laser radiation in Ar atmosphere. The synthesized films have a complex microstructure and contain product species which are formed during the pulsed-laser ablation / deposition process. The dielectric permittivities of films exhibit pronounced dispersion for frequencies higher than 10 kHz. Strong dependencies of the film permittivity on target composition, layer thickness, ambient gas pressure and relative humidity are revealed. The large dielectric permittivity of these film materials may be attributed to space-charge polarization phenomena. Films deposited from the same targets in oxygen atmosphere have much lower dielectric permittivity (ε_τ'≈ 30).

Citation Download Citation

Ionela Vrejoiu, Dan Gheorghita Matei, Johannes David Pedarnig, Dieter Bauerle, Cornel Ghica, and Maria Dinescu "Synthesis of advanced materials by pulsed-laser deposition", Proc. SPIE 5713, Photon Processing in Microelectronics and Photonics IV, (12 April 2005); https://doi.org/10.1117/12.588550

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