Calibration of compact OPC models using SEM contours

Yuri Granik

doi:10.1117/12.632218

5 November 2005 Calibration of compact OPC models using SEM contours

Yuri Granik

Proceedings Volume 5992, 25th Annual BACUS Symposium on Photomask Technology; 59921V (2005) https://doi.org/10.1117/12.632218
Event: SPIE Photomask Technology, 2005, Monterey, California, United States

Abstract

We present Optical Proximity Correction (OPC) model calibration flow which extracts printing shapes from the Scanning Electron Microscope (SEM) pictures, combines this information with CD measurements, and uses it to build OPC models. Such massive calibration comprehensively covers one- and two-dimensional printing effects, and ensures accurate corrections under widely varying proximity conditions.

Citation Download Citation

Yuri Granik "Calibration of compact OPC models using SEM contours", Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59921V (5 November 2005); https://doi.org/10.1117/12.632218

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