Evaluating films for high transmission attenuated phase shift masks

Satoru Nemoto; Toru Komizo; Yasutaka Kikuchi; Emily Gallagher; Jason Benz; Michael Hibbs; Takashi Haraguchi

doi:10.1117/12.681767

20 May 2006 Evaluating films for high transmission attenuated phase shift masks

Satoru Nemoto, Toru Komizo, Yasutaka Kikuchi, Emily Gallagher, Jason Benz, Michael Hibbs, Takashi Haraguchi

Author Affiliations +

Proceedings Volume 6283, Photomask and Next-Generation Lithography Mask Technology XIII; 628322 (2006) https://doi.org/10.1117/12.681767
Event: Photomask and Next Generation Lithography Mask Technology XIII, 2006, Yokohama, Japan

Abstract

Three types of high transmission attenuated phase shift masks were evaluated. The attenuating materials were obtained from commercial and non-commercial sources. Various key performance metrics were investigated. Blanket film transmission and reflection was measured at various wavelengths. Laser durability and cleaning durability were measured. Standard dry etch processes were used for each film and the profile and surface properties were compared. Final mask transmission and phase were also measured. The summarized results show clear benefits of using some high transmission materials relative to others.

Citation Download Citation

Satoru Nemoto, Toru Komizo, Yasutaka Kikuchi, Emily Gallagher, Jason Benz, Michael Hibbs, and Takashi Haraguchi "Evaluating films for high transmission attenuated phase shift masks", Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 628322 (20 May 2006); https://doi.org/10.1117/12.681767

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