Paper
3 May 2007 Accelerating physical verification using STPRL: a novel language for test pattern generation
Author Affiliations +
Proceedings Volume 6533, 23rd European Mask and Lithography Conference; 65331I (2007) https://doi.org/10.1117/12.736545
Event: European Mask and Lithography Conference2007, 2007, Grenoble, France
Abstract
In this work, test-patterns, test-cases and layout-patterns generations are widely investigated in the sense of turnaround time for creation and/or modification. STPRL, a novel behavioral modeling language for test-pattern creation, is being proposed. The turn-around time for both creation and modification is hugely reduced at no degradation in either accuracy or performance. Furthermore, STPRL provides considerable performance improvements in custom test-patterns creation over available automatic layout creation tools. Our method has been verified with real data at different node-technologies and for migration from and between different technology nodes.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ahmed Nouh "Accelerating physical verification using STPRL: a novel language for test pattern generation", Proc. SPIE 6533, 23rd European Mask and Lithography Conference, 65331I (3 May 2007); https://doi.org/10.1117/12.736545
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KEYWORDS
Computer programming

Optical proximity correction

Visualization

Computer programming languages

Lithography

Photomasks

Silicon

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