Automating defect disposition in fabs and maskshops

Peter Fiekowsky; S. Narukawa; T. Kawashima

doi:10.1117/12.747268

1 November 2007 Automating defect disposition in fabs and maskshops

Peter Fiekowsky, S. Narukawa, T. Kawashima

Proceedings Volume 6730, Photomask Technology 2007; 67303R (2007) https://doi.org/10.1117/12.747268
Event: SPIE Photomask Technology, 2007, Monterey, California, United States

Abstract

ADAS (Automated Defect Analysis Software) is the first product to fully automate mask defect analysis for mask shops and fabs. ADAS classifies and dispositions photomask defects quickly and accurately. Disposition is based on defect size and printability measurements from simulation. Full analysis of inspection reports with 100 defects requires 2 seconds. Printability measurements match AIMS within 6 percent at 3 sigma on 45 nm test masks. Repeatability is 5 percent at 3 sigma over multiple inspections. ADAS can reduce the need for production AIMS measurements by 90% and eliminate operator review errors and the repelliclizations they cause. ADAS increases overall inspection efficiency for mask shop first-inspection and final inspection. It can automate fab requalification inspections and eliminate the need for incoming inspection.

Citation Download Citation

Peter Fiekowsky, S. Narukawa, and T. Kawashima "Automating defect disposition in fabs and maskshops", Proc. SPIE 6730, Photomask Technology 2007, 67303R (1 November 2007); https://doi.org/10.1117/12.747268

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