Properties Of Optical Thin Films Deposited Using Ion Assisted Deposition

James J McNally; F L Williams; J R McNeil

doi:10.1117/12.939550

23 December 1986 Properties Of Optical Thin Films Deposited Using Ion Assisted Deposition

James J McNally, F L Williams, J R McNeil

Proceedings Volume 0678, Optical Thin Films II: New Developments; (1986) https://doi.org/10.1117/12.939550
Event: 30th Annual Technical Symposium, 1986, San Diego, United States

Abstract

Properties of metal oxide thin films deposited using ion assisted deposition were studied. Previously, we reported increased values of film refractive index, reduction in iqical scatter and changes in film crystalline phase for coatings deposited using ion assisted deposition.1,2 In this report we extend the previous work, and present results illustrating the effects of energetic bombardment of the growing film during deposition of Ta205, Al203 and Si02. The optical constants, optical scatter characteristics, environmental stability and stress measurements of these films are reported. In addition, coatings were deposited onto heavy metal fluoride substrates at low (150°C) temperature using ion assisted deposition. Results illustrating improvement in substrate environmental durability and abrasion resistance are reported.

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James J McNally, F L Williams, and J R McNeil "Properties Of Optical Thin Films Deposited Using Ion Assisted Deposition", Proc. SPIE 0678, Optical Thin Films II: New Developments, (23 December 1986); https://doi.org/10.1117/12.939550

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