Verification of mask manufacturing load estimation (MiLE)

Yoshikazu Nagamura; Shogo Narukawa; Yoshiharu Shika; Hiroshi Kabashima; Aki Nakajo; Isao Miyazaki; Satoshi Aoyama; Yasutaka Morikawa; Hiroshi Mohri; Tomoko Hatada; Masahiro Kato; Hidemichi Kawase

doi:10.1117/12.793114

19 May 2008 Verification of mask manufacturing load estimation (MiLE)

Yoshikazu Nagamura, Shogo Narukawa, Yoshiharu Shika, Hiroshi Kabashima, Aki Nakajo, Isao Miyazaki, Satoshi Aoyama, Yasutaka Morikawa, Hiroshi Mohri, Tomoko Hatada, Masahiro Kato, Hidemichi Kawase

Author Affiliations +

Proceedings Volume 7028, Photomask and Next-Generation Lithography Mask Technology XV; 702837 (2008) https://doi.org/10.1117/12.793114
Event: Photomask and NGL Mask Technology XV, 2008, Yokohama, Japan

Abstract

The design shrinking of semiconductor devices and the pattern complexity generated after OPC (optical proximity correction) have an impact on the two major cost consuming processes in mask manufacturing, EB (electron beam) writing and defect assurance. Mask-DFM (design for manufacturing) is a technique with various steps ranging from the design to the mask manufacturing to produce the mask friendly designs and to reduce the workload in the advanced mask production. We have previously reported on our system, called MiLE (Mask manufacturing Load Estimation), which quantifies the mask manufacturing workload by using the results of mask layout analyses. MiLE illustrates the benefits of mask-DFM efforts as numerical indexes and accelerates the DFM approaches. In this paper, we will show the accuracy of the workload estimation of the advanced devices by the comparison between the indexes and the process times in the actual mask manufacturing. The throughput of MiLE calculation of the production masks of a 65nm device was measured.

Citation Download Citation

Yoshikazu Nagamura, Shogo Narukawa, Yoshiharu Shika, Hiroshi Kabashima, Aki Nakajo, Isao Miyazaki, Satoshi Aoyama, Yasutaka Morikawa, Hiroshi Mohri, Tomoko Hatada, Masahiro Kato, and Hidemichi Kawase "Verification of mask manufacturing load estimation (MiLE)", Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 702837 (19 May 2008); https://doi.org/10.1117/12.793114

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE