Paper
4 September 2008 Field emission properties of multi-wall carbon nanotubes
Zhe-Chuan Feng, Yi-Zhe Huang, Jyh-Hua Ting, Li-Chyong Chen, Weijie Lu
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Abstract
Carbon nanotubes (CNTs) arrays were prepared by microwave plasma-enhanced chemical vapor deposition (MPCVD) method. Nickel layer of 7 nm in thickness on 100-nm thickness titanium nitride film was transformed into discrete islands after hydrogen plasma pretreatment. CNTs were then grown up on Ni-coated areas by MPCVD. Their field emission properties were studied and evaluated. From formulism analysis, superior CNT films with very low emission onset electric field, about 0.425 V/micron (at J =10 micro-A/cm2), are attained without post-deposition treatment. The large field amplification factor arising from small curvature radius of nanotube tips is responsible for good emission characteristics.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Zhe-Chuan Feng, Yi-Zhe Huang, Jyh-Hua Ting, Li-Chyong Chen, and Weijie Lu "Field emission properties of multi-wall carbon nanotubes", Proc. SPIE 7037, Carbon Nanotubes and Associated Devices, 70370R (4 September 2008); https://doi.org/10.1117/12.795563
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KEYWORDS
Carbon nanotubes

Nickel

Microwave radiation

Plasma enhanced chemical vapor deposition

Titanium

Chemical analysis

Diodes

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