Paper
17 October 2008 Sizing algorithm with continuous customizable clipping
Domingo Morales, Felipe Baytelman, Hugo Araya
Author Affiliations +
Abstract
Polygon sizing is required during Mask Data Preparation in order to generate derived layers and as process bias to account for edge effects of etching. Two main features are required for polygon sizing algorithms to be useful in Mask Data Preparation software: correctness to avoid data corruption and clipping of the projection of acute angle vertices to limit connectivity modifications. However, current available solutions are either based on heuristics, producing corrupted results for certain input, or based on algorithms which may fail to maintain original design's connectivity for certain input. A novel algorithm including customizable clipping is presented.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Domingo Morales, Felipe Baytelman, and Hugo Araya "Sizing algorithm with continuous customizable clipping", Proc. SPIE 7122, Photomask Technology 2008, 71224A (17 October 2008); https://doi.org/10.1117/12.805595
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KEYWORDS
Etching

Chlorine

Electronic design automation

Photomasks

Algorithm development

Current controlled current source

Photomask technology

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