EUV and debris characteristics of a laser-plasma tin-dioxide colloidal target

Shoichi Kubodera; Masanori Kaku; Shunsuke Touge; Masahito Katto

doi:10.1117/12.816882

21 April 2009 EUV and debris characteristics of a laser-plasma tin-dioxide colloidal target

Shoichi Kubodera, Masanori Kaku, Shunsuke Touge, Masahito Katto

Proceedings Volume 7131, XVII International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers; 71311O (2009) https://doi.org/10.1117/12.816882
Event: XVII International Symposium on Gas Flow and Chemical Lasers and High Power Lasers, 2008, Lisboa, Portugal

Abstract

Characteristics of extreme ultraviolet (EUV) and debris emissions as well as debris reduction have been investigated for a laser-produced plasma (LPP) EUV source by using a colloidal/liquid jet target containing tin dioxide nanoparticles and tin chloride. The amount of deposited debris on a silicon witness plate was determined by a total laser energy irradiated onto a target. Double-pulse laser irradiation was effective for improving the EUV conversion efficiency as a result of plasma regulation. It was, however, not effective for reducing the deposited debris from a colloidal target with nanoparticles. In situ low-temperature heating of the witness plate was effective to reduce the amount of deposited debris. Room-temperature photon processing using an incoherent vacuum ultraviolet excimer lamp at 126 nm deoxidized a deposited tin oxide layer. In addition to these active debris reduction methods, the use of a tin chloride liquid target at a certain concentration passively reduced the amount of deposited debris as a result of production of chlorine atoms that sputtered and/or etched deposition. The EUV CE of more than 1% was observed from a tin chloride target by using double-pulse laser irradiation.

Citation Download Citation

Shoichi Kubodera, Masanori Kaku, Shunsuke Touge, and Masahito Katto "EUV and debris characteristics of a laser-plasma tin-dioxide colloidal target", Proc. SPIE 7131, XVII International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, 71311O (21 April 2009); https://doi.org/10.1117/12.816882

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