Photothermal measurement of absorption and wavefront deformations in fused silica

K. Mann; A. Bayer; J. Gloger; U. Leinhos; T. Rousseau; B. Schäfer

doi:10.1117/12.804565

30 December 2008 Photothermal measurement of absorption and wavefront deformations in fused silica

K. Mann, A. Bayer, J. Gloger, U. Leinhos, T. Rousseau, B. Schäfer

Proceedings Volume 7132, Laser-Induced Damage in Optical Materials: 2008; 71321F (2008) https://doi.org/10.1117/12.804565
Event: Boulder Damage Symposium XL Annual Symposium on Optical Materials for High Power Lasers, 2008, Boulder, Colorado, United States

Abstract

'Thermal lenses' in fused silica due to absorbed UV laser radiation can diminish the achievable spatial resolution of the lithographic process in semiconductor wafer steppers. We developed a measurement system for spatially resolved registration of induced wavefront deformations, utilizing a Hartmann-Shack wavefront sensor with extreme sensitivity (λ/10,000). The photo-thermal technique can be employed for a rapid assessment of the material quality, since the wavefront deformation is directly proportional to the absorption losses. Along with a description of this new technique, we present results from photo-thermal measurements on fused silica under 193nm irradiation, as well as a comparison with thermal theory.

Citation Download Citation

K. Mann, A. Bayer, J. Gloger, U. Leinhos, T. Rousseau, and B. Schäfer "Photothermal measurement of absorption and wavefront deformations in fused silica", Proc. SPIE 7132, Laser-Induced Damage in Optical Materials: 2008, 71321F (30 December 2008); https://doi.org/10.1117/12.804565

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