Current benchmarking results of EUV resist at Selete

Daisuke Kawamura; Koji Kaneyama; Shinji Kobayashi; Hiroaki Oizumi; Toshiro Itani

doi:10.1117/12.804665

4 December 2008 Current benchmarking results of EUV resist at Selete

Daisuke Kawamura, Koji Kaneyama, Shinji Kobayashi, Hiroaki Oizumi, Toshiro Itani

Proceedings Volume 7140, Lithography Asia 2008; 714008 (2008) https://doi.org/10.1117/12.804665
Event: SPIE Lithography Asia - Taiwan, 2008, Taipei, Taiwan

Abstract

The main challenge facing the implementation of EUV resist and processing has been concurrent achievement of high sensitivity, high resolution, and low line width roughness (LWR). In order to improve the performance of EUV resist, Selete is actively pursuing its benchmarking. The results from this benchmarking were found to be as follows: E_size improved with the increasing capability of EUV pattern exposure. Sensitivity improved during this year. Resolution is found to be almost sufficient for 32-nm half-pitch (hp), but not quite good enough for 22-nm hp. Resist blur of the resist, which marked good score in benchmarking, is found to be 10nm to 11nm. LWR is still far from its target value.

Citation Download Citation

Daisuke Kawamura, Koji Kaneyama, Shinji Kobayashi, Hiroaki Oizumi, and Toshiro Itani "Current benchmarking results of EUV resist at Selete", Proc. SPIE 7140, Lithography Asia 2008, 714008 (4 December 2008); https://doi.org/10.1117/12.804665

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available