Fabrication of position-controlled InN nanocolumns by ECR-MBE

T. Araki; D. Fukuoka; H. Tamiya; S. Harui; H. Miyake; K. Hiramatsu; Y. Nanishi

doi:10.1117/12.811764

16 February 2009 Fabrication of position-controlled InN nanocolumns by ECR-MBE

T. Araki, D. Fukuoka, H. Tamiya, S. Harui, H. Miyake, K. Hiramatsu, Y. Nanishi

Proceedings Volume 7216, Gallium Nitride Materials and Devices IV; 72160N (2009) https://doi.org/10.1117/12.811764
Event: SPIE OPTO: Integrated Optoelectronic Devices, 2009, San Jose, California, United States

Abstract

Position controlled InN nanocolumns were fabricated by electron-cyclotron-resonance plasma-excited molecular beam epitaxy (ECR-MBE) on hole-patterned GaN template by focused ion beam (FIB). Dependences of morphological changes in InN nanocolumn on V/III ratio and hole size were investigated. It is found that growth with a higher V/III ratio and a larger hole size resulted in the multiple formation of InN nanocolumns in one hole. By varying the hole density on the GaN template, we succeeded to change the density of InN nanocolumn by one order of magnitude from about 100/μm² to 9/μm². InN nanocolumn showed luminescence with peak energy of 0.74 eV by cathodoluminescence measurement.

Citation Download Citation

T. Araki, D. Fukuoka, H. Tamiya, S. Harui, H. Miyake, K. Hiramatsu, and Y. Nanishi "Fabrication of position-controlled InN nanocolumns by ECR-MBE", Proc. SPIE 7216, Gallium Nitride Materials and Devices IV, 72160N (16 February 2009); https://doi.org/10.1117/12.811764

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