Inspection 13.2-nm table-top full-field microscope

F. Brizuela; Y. Wang; C. A. Brewer; F. Pedaci; W. Chao; E. H. Anderson; Y. Liu; K. A. Goldberg; P. P. Naulleau; P. W. Wachulak; M. C. Marconi; D. T. Attwood; J. J. Rocca; C. S. Menoni

doi:10.1117/12.814320

18 March 2009 Inspection 13.2-nm table-top full-field microscope

F. Brizuela, Y. Wang, C. A. Brewer, F. Pedaci, W. Chao, E. H. Anderson, Y. Liu, K. A. Goldberg, P. P. Naulleau, P. W. Wachulak, M. C. Marconi, D. T. Attwood, J. J. Rocca, C. S. Menoni

Author Affiliations +

Proceedings Volume 7271, Alternative Lithographic Technologies; 72713F (2009) https://doi.org/10.1117/12.814320
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

We present results on a table-top microscope that uses an EUV stepper geometry to capture full-field images with a halfpitch spatial resolution of 55 nm. This microscope uses a 13.2 nm wavelength table-top laser for illumination and acquires images of reflective masks with exposures of 20 seconds. These experiments open the path to the realization of high resolution table-top imaging systems for actinic defect characterization.

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F. Brizuela, Y. Wang, C. A. Brewer, F. Pedaci, W. Chao, E. H. Anderson, Y. Liu, K. A. Goldberg, P. P. Naulleau, P. W. Wachulak, M. C. Marconi, D. T. Attwood, J. J. Rocca, and C. S. Menoni "Inspection 13.2-nm table-top full-field microscope", Proc. SPIE 7271, Alternative Lithographic Technologies, 72713F (18 March 2009); https://doi.org/10.1117/12.814320

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