Paper
23 September 2009 Sub-resolution assist features placement using cost-function-reduction method
Jinyu Zhang, Wei Xiong, Yan Wang, Zhiping Yu, Min-Chun Tsai
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Abstract
We proposed a new method of generating and optimizing sub-resolution assist features (SRAFs). This method is based on a newly proposed ILT algorithm-Cost-function-Reduction method (CFRM). CFRM is proved to be much effective and efficient than gradient-based algorithm and traditional simulated annealing method. We improve CFRM to be an initial condition independent algorithm (ICIA) by tuning some running parameters. The robustness of ICIA is verified numerically by six mask patterns and two mask technologies in partial-coherence image model using 100 randomly generated mask patterns. Results showed that all are converged to similar final mask patterns with less than 3% differences of the final image edge placement error (EPE). The skeleton of the final mask pattern can be decided by first tens of iterations. Based on the above properties, an efficient and effective algorithm is proposed to handle SRAFs placement. This effectiveness method is demonstrated by different patterns using different mask technologies.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jinyu Zhang, Wei Xiong, Yan Wang, Zhiping Yu, and Min-Chun Tsai "Sub-resolution assist features placement using cost-function-reduction method", Proc. SPIE 7488, Photomask Technology 2009, 748811 (23 September 2009); https://doi.org/10.1117/12.834099
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Cited by 1 scholarly publication.
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KEYWORDS
Photomasks

SRAF

Binary data

Atrial fibrillation

Semiconducting wafers

Double patterning technology

Optical proximity correction

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