Optical coatings with ultralow refractive index SiO2 films

Jue Wang; Bin Zhou; Jun Shen; Guangming Wu

doi:10.1117/12.836252

31 December 2009 Optical coatings with ultralow refractive index SiO₂ films

Jue Wang, Bin Zhou, Jun Shen, Guangming Wu

Proceedings Volume 7504, Laser-Induced Damage in Optical Materials: 2009; 75040F (2009) https://doi.org/10.1117/12.836252
Event: Laser Damage Symposium XLI: Annual Symposium on Optical Materials for High Power Lasers, 2009, Boulder, Colorado, United States

Abstract

Advantages of utilizing ultralow refractive index layers in optical coatings include broadband and wide angle spectral performance. Ultralow refractive index films can be fabricated by chemical method and physical vapor deposition. In the chemical method, ultralow refractive indices are controlled by sol-gel derived nanostructures. In the physical method, ultralow refractive indices are obtained by self-shadowing nature in oblique angle deposition. Techniques for ultralow refractive index silica formation and characterizations are reviewed. Chemical, mechanical and optical properties of the ultralow refractive index silica are presented. Optical coatings consisting of the ultralow refractive index silica layers are discussed in a spectral regime from IR down to DUV.

Citation Download Citation

Jue Wang, Bin Zhou, Jun Shen, and Guangming Wu "Optical coatings with ultralow refractive index SiO₂ films", Proc. SPIE 7504, Laser-Induced Damage in Optical Materials: 2009, 75040F (31 December 2009); https://doi.org/10.1117/12.836252

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