Optical critical dimension measurements for patterned media with 10's nm feature size

Yongdong Liu; Milad Tabet; Jiangtao Hu; Zhaoning Yu; Justin Hwu; Wei Hu; Sha Zhu; Gene Gauzner; Kim Lee; Shifu Lee

doi:10.1117/12.839523

11 December 2009 Optical critical dimension measurements for patterned media with 10's nm feature size

Yongdong Liu, Milad Tabet, Jiangtao Hu, Zhaoning Yu, Justin Hwu, Wei Hu, Sha Zhu, Gene Gauzner, Kim Lee, Shifu Lee

Author Affiliations +

Proceedings Volume 7520, Lithography Asia 2009; 75200H (2009) https://doi.org/10.1117/12.839523
Event: SPIE Lithography Asia, 2009, Taipei, Taiwan

Abstract

Patterned media is expected to be implemented in future generations of hard disk drives to provide data storage at densities exceeding 10¹² bits/in² and beyond. The implementation of patterned media, which would involve developing processing methods to offer high resolution (small bits), regular patterns, and high density, has posed a number of metrology challenges. Optical Critical Dimension (OCD) is the leading candidate to overcome the metrology challenges for patterned media. This paper presents the successful OCD measurements on the critical dimensions, sidewall-angles, and detailed sidewall shape of gratings of quartz template and imprint disk with pitch as small as 57nm.

Citation Download Citation

Yongdong Liu, Milad Tabet, Jiangtao Hu, Zhaoning Yu, Justin Hwu, Wei Hu, Sha Zhu, Gene Gauzner, Kim Lee, and Shifu Lee "Optical critical dimension measurements for patterned media with 10's nm feature size", Proc. SPIE 7520, Lithography Asia 2009, 75200H (11 December 2009); https://doi.org/10.1117/12.839523

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