High reflectance multilayers for EUVL HVM-projection optics

E. Louis; E. D. van Hattum; S. Alonso van der Westen; P. Sallé; K. T. Grootkarzijn; E. Zoethout; F. Bijkerk; G. von Blanckenhagen; S. Müllender

doi:10.1117/12.846566

22 March 2010 High reflectance multilayers for EUVL HVM-projection optics

E. Louis, E. D. van Hattum, S. Alonso van der Westen, P. Sallé, K. T. Grootkarzijn, E. Zoethout, F. Bijkerk, G. von Blanckenhagen, S. Müllender

Author Affiliations +

Proceedings Volume 7636, Extreme Ultraviolet (EUV) Lithography; 76362T (2010) https://doi.org/10.1117/12.846566
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

Reported is a summary of multilayer deposition results by FOM on three elements of the projection optics of the ASML Extreme UV Lithography HVM tools. The coating process used is e-beam evaporation in combination with low-energy ion-beam smoothening. The reflectance of the coatings, which are covered with a special protective capping layer, is typically around 68%, with a maximum value of 69.6% and a non-correctable figure error added by the full multilayer stack of better than 35 picometer. The results are compared to the earlier coatings of the EUVL Process Development Tool.

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E. Louis, E. D. van Hattum, S. Alonso van der Westen, P. Sallé, K. T. Grootkarzijn, E. Zoethout, F. Bijkerk, G. von Blanckenhagen, and S. Müllender "High reflectance multilayers for EUVL HVM-projection optics", Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76362T (22 March 2010); https://doi.org/10.1117/12.846566

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