Partial spatial coherence in an excimer-laser lithographic imaging system

Arlene Smith; Anna Burvall; Christopher Dainty

doi:10.1117/12.846349

3 March 2010 Partial spatial coherence in an excimer-laser lithographic imaging system

Arlene Smith, Anna Burvall, Christopher Dainty

Proceedings Volume 7640, Optical Microlithography XXIII; 764029 (2010) https://doi.org/10.1117/12.846349
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

We have recently explored the Elementary Function method, previously presented by Wald et al (Proc. SPIE 59621G, 2005), and we have demonstrated under what circumstances this method can be used to reduce the propagation calculations of partially coherent light to two dimensions. In this paper, we examine the methods used to measure the spatial coherence of a light source in the literature. We present a method based on work previously shown by Mejia et al (Opt Comm 273 (428-434), 2007) which uses an array of pinholes with one degree of redundancy. We discuss the design of the pinhole array and present the results of some simulations.

Citation Download Citation

Arlene Smith, Anna Burvall, and Christopher Dainty "Partial spatial coherence in an excimer-laser lithographic imaging system", Proc. SPIE 7640, Optical Microlithography XXIII, 764029 (3 March 2010); https://doi.org/10.1117/12.846349

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