Machine specific fracture optimization for JEOL e-beam mask writer

Johnny Yeap; Raghava Kondepudy; Parikshit Kulkarni; Yuichi Kawase; Russell Cinque

doi:10.1117/12.864159

26 May 2010 Machine specific fracture optimization for JEOL e-beam mask writer

Johnny Yeap, Raghava Kondepudy, Parikshit Kulkarni, Yuichi Kawase, Russell Cinque

Author Affiliations +

Proceedings Volume 7748, Photomask and Next-Generation Lithography Mask Technology XVII; 77481R (2010) https://doi.org/10.1117/12.864159
Event: Photomask and NGL Mask Technology XVII, 2010, Yokohama, Japan

Abstract

Traditionally, Mask Data Preparation (MDP) flow for Variable Shape E-Beam (VSB) writers has been optimized in a generic fashion to minimize slivers and reduce shot count while maintaining data symmetry. To date, this approach has been sufficient and allowed the mask industry to meet requirements for CD uniformity, registration, and write time. However, ever tighter error budgets and increasing pattern complexity are driving a need for writer-specific optimization of MDP. This paper summarizes the joint development effort between Synopsys and JEOL to optimize MDP fractures for the JEOL platform. The advantages and challenges of platform specific optimization are discussed.

Citation Download Citation

Johnny Yeap, Raghava Kondepudy, Parikshit Kulkarni, Yuichi Kawase, and Russell Cinque "Machine specific fracture optimization for JEOL e-beam mask writer", Proc. SPIE 7748, Photomask and Next-Generation Lithography Mask Technology XVII, 77481R (26 May 2010); https://doi.org/10.1117/12.864159

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