High sensitive and fast scanner focus monitoring method using forbidden pitch pattern

Jinseok Heo; Jeong-Ho Yeo; Younghee Kim

doi:10.1117/12.879802

20 April 2011 High sensitive and fast scanner focus monitoring method using forbidden pitch pattern

Jinseok Heo, Jeong-Ho Yeo, Younghee Kim

Proceedings Volume 7971, Metrology, Inspection, and Process Control for Microlithography XXV; 79711C (2011) https://doi.org/10.1117/12.879802
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

Forbidden pitch which is introduced under a dipole illumination condition has extremely narrow DOF (Depth Of Focus). Therefore when a lithographic pattern is transferred on a wafer the forbidden pitch should be removed from the layout. However this narrow DOF behavior can be utilized to monitor a focus of scanner systems due to its sensitiveness to focus changes. In this paper, a newly developed focus monitoring method utilizing a forbidden pitch pattern will be introduced and the benefits and sensitivity of this method will be discussed in details.

Citation Download Citation

Jinseok Heo, Jeong-Ho Yeo, and Younghee Kim "High sensitive and fast scanner focus monitoring method using forbidden pitch pattern", Proc. SPIE 7971, Metrology, Inspection, and Process Control for Microlithography XXV, 79711C (20 April 2011); https://doi.org/10.1117/12.879802

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