Multiresolution mask writing

Emile Sahouria

doi:10.1117/12.881929

1 April 2011 Multiresolution mask writing

Emile Sahouria

Author Affiliations +

Proceedings Volume 7985, 27th European Mask and Lithography Conference; 798503 (2011) https://doi.org/10.1117/12.881929
Event: 27th European Mask and Lithography Conference, 2011, Dresden, Germany

Abstract

We propose changing the shot pattern between passes in multi-pass vector e-beam writing in order to reduce total shot count. One pass is detailed while the other is simplified. Mask process correction is used to produce the correct image from the sum of the exposures; a fundamental contstraint is enforced to retain process latitude. Results from a software implementation show a total shot savings in the range of 18 to 31 percent for two-pass writing versus the conventional writing scheme in which each pass writes identical shot sets. Simulation results demonstrate the feasibility of the technique.

Citation Download Citation

Emile Sahouria "Multiresolution mask writing", Proc. SPIE 7985, 27th European Mask and Lithography Conference, 798503 (1 April 2011); https://doi.org/10.1117/12.881929

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE