Shape-dependent dose margin correction using model-based mask data preparation

Yasuki Kimura; Ryuuji Yamamoto; Takao Kubota; Kenji Kouno; Shohei Matsushita; Kazuyuki Hagiwara; Daisuke Hara

doi:10.1117/12.958601

8 November 2012 Shape-dependent dose margin correction using model-based mask data preparation

Yasuki Kimura, Ryuuji Yamamoto, Takao Kubota, Kenji Kouno, Shohei Matsushita, Kazuyuki Hagiwara, Daisuke Hara

Author Affiliations +

Proceedings Volume 8522, Photomask Technology 2012; 85221I (2012) https://doi.org/10.1117/12.958601
Event: SPIE Photomask Technology, 2012, Monterey, California, United States

Abstract

Dose Margin has always been known to be a critical factor in mask making. This paper describes why the issue is far more critical than ever before with the 20-nm logic node and beyond using ArF Immersion lithography. Model-Based Mask Data Preparation (MB-MDP) had been presented [references] to show shot count improvements for these complex masks. This paper describes that MBMDP also improves the dose margin. The improvement predicted with theoretical simulation with D2S is confirmed by the results of real mask written by JBX-3200MV (JEOL) by HOYA.

Citation Download Citation

Yasuki Kimura, Ryuuji Yamamoto, Takao Kubota, Kenji Kouno, Shohei Matsushita, Kazuyuki Hagiwara, and Daisuke Hara "Shape-dependent dose margin correction using model-based mask data preparation", Proc. SPIE 8522, Photomask Technology 2012, 85221I (8 November 2012); https://doi.org/10.1117/12.958601

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