Double patterning: solutions in parasitic extraction

Dusan Petranovic; James Falbo; Nur Kurt-Karsilayan

doi:10.1117/12.2010838

29 March 2013 Double patterning: solutions in parasitic extraction

Dusan Petranovic, James Falbo, Nur Kurt-Karsilayan

Author Affiliations +

Proceedings Volume 8684, Design for Manufacturability through Design-Process Integration VII; 86840M (2013) https://doi.org/10.1117/12.2010838
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

In this paper, we analyze advantages and disadvantages of various extraction-based techniques applied to colorless and colored double patterning layouts. Two techniques are presented: (1) an effective dielectric constant-based technique, which modifies the dielectric constants to obtain an equivalent capacitance change as would result from mask misalignment, and (2) an offset-based, less conservative technique, that proposes the use of custom corners. Experimental results illustrate the impact of double patterning on the parasitics, and allow us to compare these techniques.

Citation Download Citation

Dusan Petranovic, James Falbo, and Nur Kurt-Karsilayan "Double patterning: solutions in parasitic extraction", Proc. SPIE 8684, Design for Manufacturability through Design-Process Integration VII, 86840M (29 March 2013); https://doi.org/10.1117/12.2010838

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