Ultraviolet curing nanoimprint green lithography using water-repellent film derived from biomass for solar cells devices

Satoshi Takei; Kenta Ito; Gaku Murakami; Tsutomu Obata; Yoshiyuki Yokoyama; Kigenn Sugahara; Takumi Ichikawa; Wataru Mizuno; Junji Sumioka; Masayuki Fujii; Tetsuro Okada

doi:10.1117/12.2045640

14 May 2014 Ultraviolet curing nanoimprint green lithography using water-repellent film derived from biomass for solar cells devices

Satoshi Takei, Kenta Ito, Gaku Murakami, Tsutomu Obata, Yoshiyuki Yokoyama, Kigenn Sugahara, Takumi Ichikawa, Wataru Mizuno, Junji Sumioka, Masayuki Fujii, Tetsuro Okada

Author Affiliations +

Proceedings Volume 9140, Photonics for Solar Energy Systems V; 91400V (2014) https://doi.org/10.1117/12.2045640
Event: SPIE Photonics Europe, 2014, Brussels, Belgium

Abstract

The design concepts of an ecofriendly water-repellent film using the sugar-related organic compounds with fluorinated alkyl group derived from biomass are demonstrated to avoid various kinds of nanoimprint material pattern peeling, defects, particles, and contaminants in ultraviolet curing nanoimprint lithography. Developed sugar-related organic compounds with three glucose derivatives with ultraviolet curable groups or fluorinated alkyl group derived from biomass produced high-quality imprint images of pillar patterns with a 230-300 nm diameter and height of 200-250 nm. The ecofriendly waterrepellent film as a functional biomass material was indicated to achieve the high water contact angle of 102°, low surface free energy of 22.1, suitable refractive index of 1.42-1.50, and high transparency at the wavelength of 350-700 nm.

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Satoshi Takei, Kenta Ito, Gaku Murakami, Tsutomu Obata, Yoshiyuki Yokoyama, Kigenn Sugahara, Takumi Ichikawa, Wataru Mizuno, Junji Sumioka, Masayuki Fujii, and Tetsuro Okada "Ultraviolet curing nanoimprint green lithography using water-repellent film derived from biomass for solar cells devices", Proc. SPIE 9140, Photonics for Solar Energy Systems V, 91400V (14 May 2014); https://doi.org/10.1117/12.2045640

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KEYWORDS

Ultraviolet radiation

Nanoimprint lithography

Lithography

Glucose

Silicon

Liquids

Optical lithography

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