Contrast And Sensitivity Trade-Offs Of Resist Processing In Electron Beam Lithography At 0.5,U,M And Below

W W Molzen; M G Rosenfield; K T Kwietniak; K G Chiong; A D Wilson; F J Hohn

doi:10.1117/12.945642

14 June 1988 Contrast And Sensitivity Trade-Offs Of Resist Processing In Electron Beam Lithography At 0.5μM And Below

W W Molzen, M G Rosenfield, K T Kwietniak, K G Chiong, A D Wilson, F J Hohn

Proceedings Volume 0923, Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII; (1988) https://doi.org/10.1117/12.945642
Event: Medical Imaging II, 1988, Newport Beach, CA, United States

Abstract

Frequently occurring questions such as the minimum dose necessary to expose a resist system in electron beam lithography were investigated to determine the limits of resist performance at half micron dimensions and below. The processing window for exposing and developing resist coated wafers is presented as a function of the development conditions. Optimum exposure and processing conditions will be defined as these parameters relate to resist contrast. Several methods for fine tuning a resist process for electron beam lithography at 0.54um dimensions and below are presented. Various techniques are discussed which are used as variables to achieve the line width control necessary for multilevel lithography at ground rules of +0.1µm 3a for 0.5μm fully scaled devices and circuits. In addition, the intimate relationship of the resist contrast and sensitivity to the trade-offs of resist processing are also discussed.

Citation Download Citation

W W Molzen, M G Rosenfield, K T Kwietniak, K G Chiong, A D Wilson, and F J Hohn "Contrast And Sensitivity Trade-Offs Of Resist Processing In Electron Beam Lithography At 0.5μM And Below", Proc. SPIE 0923, Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII, (14 June 1988); https://doi.org/10.1117/12.945642

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available