Two-dimension lateral shearing interferometry for microscope objective wavefront metrology

Zhixiang Liu; Tingwen Xing; Yadong Jiang; Baobin Lv; Fuchao Xu

doi:10.1117/12.2071500

5 November 2014 Two-dimension lateral shearing interferometry for microscope objective wavefront metrology

Zhixiang Liu, Tingwen Xing, Yadong Jiang, Baobin Lv, Fuchao Xu

Proceedings Volume 9272, Optical Design and Testing VI; 92721B (2014) https://doi.org/10.1117/12.2071500
Event: SPIE/COS Photonics Asia, 2014, Beijing, China

Abstract

Lateral shearing interferometry was an attractive technique to measure the wavefront aberration of high numerical aperture microscope objective lens. A two-dimension lateral shearing interferometer based on chessboard grating was designed for microscope objective wavefront metrology. By positioning the chessboard grating at the Talbot distance of the objective focal plane, the wavefront was divided and sheared in two-dimension. By applying two-dimensional Fourier transform method and differential Zernike polynomial fitting, Zernike coefficients of the wavefront were obtained. A 10x, NA0.25 microscope objective was measured at 632.8nm wavelength, the results showed that the wavefront of the objective was 0.755λ PV, 0.172λ RMS, the repeatability(3σ) of RMS at random grating position was 2.3mλ, the repeatability(3σ) of Z5 to Z36 at random grating position were better than 17mλ.

Citation Download Citation

Zhixiang Liu, Tingwen Xing, Yadong Jiang, Baobin Lv, and Fuchao Xu "Two-dimension lateral shearing interferometry for microscope objective wavefront metrology", Proc. SPIE 9272, Optical Design and Testing VI, 92721B (5 November 2014); https://doi.org/10.1117/12.2071500

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