Effects of annealing on properties of Al2O3 monolayer films at 355 nm

Feifei Tu; Hu Wang; Huanbin Xing; Ruxi Zheng; Weili Zhang; Kui Yi

doi:10.1117/12.2185988

14 July 2015 Effects of annealing on properties of Al₂O₃ monolayer film at 355 nm

Feifei Tu, Hu Wang, Huanbin Xing, Ruxi Zheng, Weili Zhang, Kui Yi

Author Affiliations +

Proceedings Volume 9532, Pacific Rim Laser Damage 2015: Optical Materials for High-Power Lasers; 95321F (2015) https://doi.org/10.1117/12.2185988
Event: Pacific Rim Laser Damage, 2015, Jiading, Shanghai, China

Abstract

Al₂O₃ monolayer films were deposited on fused silica substrate and K9 glass substrate by electron-beam deposition. Annealing as a general post-treatment was used to enhance the quality of the Al₂O₃ coatings. The optical properties of the films were analyzed from the transmission spectra of the samples. The composition of the samples before and after annealing were measured by X-ray photoelectron spectroscopy (XPS). According to the analysis of the results, it can be found that the oxidation degree of the coatings increases after annealing in O₂ inside coating chamber. The laser-induced damage thresholds of the Al₂O₃ films can be increased after the annealing process. Finally, the damage morphologies of the Al₂O₃ coatings were analyzed.

Citation Download Citation

Feifei Tu, Hu Wang, Huanbin Xing, Ruxi Zheng, Weili Zhang, and Kui Yi "Effects of annealing on properties of Al₂O₃ monolayer film at 355 nm", Proc. SPIE 9532, Pacific Rim Laser Damage 2015: Optical Materials for High-Power Lasers, 95321F (14 July 2015); https://doi.org/10.1117/12.2185988

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