Study of nanometer-thick graphite film for high-power EUVL pellicle

Mun Ja Kim; Hwan Chul Jeon; Roman Chalykh; Eokbong Kim; Jihoon Na; Byung-Gook Kim; Heebom Kim; Chanuk Jeon; Seul-Gi Kim; Dong-Wook Shin; Taesung Kim; Sooyoung Kim; Jung Hun Lee; Ji-Beom Yoo

doi:10.1117/12.2218228

18 March 2016 Study of nanometer-thick graphite film for high-power EUVL pellicle

Mun Ja Kim, Hwan Chul Jeon, Roman Chalykh, Eokbong Kim, Jihoon Na, Byung-Gook Kim, Heebom Kim, Chanuk Jeon, Seul-Gi Kim, Dong-Wook Shin, Taesung Kim, Sooyoung Kim, Jung Hun Lee, Ji-Beom Yoo

Author Affiliations +

Proceedings Volume 9776, Extreme Ultraviolet (EUV) Lithography VII; 97761Z (2016) https://doi.org/10.1117/12.2218228
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

Extreme ultraviolet (EUV) lithography has received much attention in the semiconductor industry as a promising candidate to extend dimensional scaling beyond 10nm. Recently EUV pellicle introduction is required to improve particle level inside scanner for EUV mass production. We demonstrate that a new pellicle material, nanometer-thick graphite film (NGF), is one of the best candidates of EUV pellicle membrane. A NGF pellicle with excellent thermal (ε≥0.4 @R.T, <100nm), mechanical (415MPa @~100nm), chemical and optical (24hrs durability under exposure of EUV/H₂ at 4W/cm² with pH₂~5Pa) properties can be a promising and superb candidate for EUV pellicle membrane compared to Si pellicles with capping layers.

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Mun Ja Kim, Hwan Chul Jeon, Roman Chalykh, Eokbong Kim, Jihoon Na, Byung-Gook Kim, Heebom Kim, Chanuk Jeon, Seul-Gi Kim, Dong-Wook Shin, Taesung Kim, Sooyoung Kim, Jung Hun Lee, and Ji-Beom Yoo "Study of nanometer-thick graphite film for high-power EUVL pellicle", Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 97761Z (18 March 2016); https://doi.org/10.1117/12.2218228

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