Generalized measurement configuration optimization for accurate reconstruction of periodic nanostructures using optical scatterometry

Jinlong Zhu; Yating Shi; Shiyuan Liu; Lynford L. Goddard

doi:10.1117/12.2218988

8 March 2016 Generalized measurement configuration optimization for accurate reconstruction of periodic nanostructures using optical scatterometry

Jinlong Zhu, Yating Shi, Shiyuan Liu, Lynford L. Goddard

Author Affiliations +

Proceedings Volume 9778, Metrology, Inspection, and Process Control for Microlithography XXX; 977823 (2016) https://doi.org/10.1117/12.2218988
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

Optical scatterometry is a model based technique, which conventionally requires minimization of a predefined least square function. This minimization relies heavily on the measurement configuration: wavelength, incident angle, azimuthal angle, and sample position, which brings up the question of how to find the configuration that maximizes measurement accuracy. We propose a general measurement configuration optimization method based on error propagation theory and singular value decomposition, by which the measurement accuracy can be approximated as a function of a Jacobian matrix with respect to the measurement configurations. Simulation and experiments for a one-dimensional trapezoidal grating establishes the feasibility of the proposed method.

Citation Download Citation

Jinlong Zhu, Yating Shi, Shiyuan Liu, and Lynford L. Goddard "Generalized measurement configuration optimization for accurate reconstruction of periodic nanostructures using optical scatterometry", Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 977823 (8 March 2016); https://doi.org/10.1117/12.2218988

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