Paper
16 March 2016 Directed self-assembly aware restricted design rule and its impact on design ability
Author Affiliations +
Abstract
Directed self-assembly (DSA), the epitaxial alignment of block copolymers to minimize the system free energy, is prone to defects that are random and difficult to eliminate. When creating fins for FinFET devices, the defect density is known to be a strong function of guide pattern CD. We propose the use of a restricted design rule (RDR) that limits the guide pattern CD to achieve low defectivity, and also report its impact on overall chip area and design-ability of logic, analog IO, and SRAM. The restricted design rule in defining guide pattern CD is extracted from empirical data. Design rule check (DRC) is applied to GLOBALFOUNDRIES' technology chip design to estimate the penalty of DSA RDR on fin layer.
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Yulu Chen and Ryoung-han Kim "Directed self-assembly aware restricted design rule and its impact on design ability", Proc. SPIE 9781, Design-Process-Technology Co-optimization for Manufacturability X, 978104 (16 March 2016); https://doi.org/10.1117/12.2219216
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KEYWORDS
Directed self assembly

Information operations

Analog electronics

Annealing

Etching

Evolutionary algorithms

Optical lithography

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