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13 June 2022 Novel litho track hardware features and its contribution to EUV defect reduction
Andreia Santos
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Proceedings Volume PC12055, Advances in Patterning Materials and Processes XXXIX; PC1205502 (2022) https://doi.org/10.1117/12.2614668
Event: SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States
Abstract
Lithography track performance capabilities have been rapidly expanding through the years and have reached such a level of sophistication that focusing on classic metrics such as throughput, yield, cleanliness, and process stability is no longer enough. Currently, in addition to these traditional efforts, track manufacturers are developing advanced hardware features that can help resist suppliers achieve the stringent patterning requirements currently in place. Via this holistic approach, resist and track vendors can have an extensive collaboration and explore together various lithographic performance improvement opportunities. In this work, we investigate the capability of novel hardware solutions currently available on our SCREEN DT-3000 coat-develop track system to reduce EUV resist defectivity. The potential of using these innovative features to favorably modify the surface of different photoresists was deeply explored, and new enhanced process alternatives for different material types were successfully identified. We hereby present our work using a DT-3000 track and EUV NXE:3400C scanner to improve defectivity levels of aggressive 16nmhp L/S patterns.
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Andreia Santos "Novel litho track hardware features and its contribution to EUV defect reduction", Proc. SPIE PC12055, Advances in Patterning Materials and Processes XXXIX, PC1205502 (13 June 2022); https://doi.org/10.1117/12.2614668
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KEYWORDS
Extreme ultraviolet
Lithography
Extreme ultraviolet lithography
Manufacturing
Optical lithography
Photoresist materials
Scanners
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