DUV mask writer addressable to 90nm nodes with a sustainability profile

Robert Eklund; Mikael Wahlsten; Mats Rosling; Martin Glimtoft; Gunnar Gustafsson; Ylva Mjöberg Wentzel; Anna-Karin Drake; Youngjin Park

doi:10.1117/12.2641791

11 November 2022 DUV mask writer addressable to 90nm nodes with a sustainability profile

Robert Eklund, Mikael Wahlsten, Mats Rosling, Martin Glimtoft, Gunnar Gustafsson, Ylva Mjöberg Wentzel, Anna-Karin Drake, Youngjin Park

Author Affiliations +

Proceedings Volume PC12293, Photomask Technology 2022; PC122930J (2022) https://doi.org/10.1117/12.2641791
Event: SPIE Photomask Technology + EUV Lithography, 2022, Monterey, California, United States

Abstract

Global semiconductor market is expected to have strong growth driven by various applications but suffering for the chip shortages. Tight supply is expected also in semiconductor photomask industry and the leading-edge photomask tend to have the most of the attention but concern increases in mature photomask supply chain coupled with aging photomask writers. Mycronic has introduced the SLX series to contribute solving existing issues design with sustainability profile. We will share the latest evaluation data from the system and share environmental impact of the SLX through LCA (Life Cycle Analysis).

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Robert Eklund, Mikael Wahlsten, Mats Rosling, Martin Glimtoft, Gunnar Gustafsson, Ylva Mjöberg Wentzel, Anna-Karin Drake, and Youngjin Park "DUV mask writer addressable to 90nm nodes with a sustainability profile", Proc. SPIE PC12293, Photomask Technology 2022, PC122930J (11 November 2022); https://doi.org/10.1117/12.2641791

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