We present a new-generation atomic layer deposition (ALD) technology that revolutionizes the production of conformal optical coatings: the spatial ALD. In spatial ALD, the substrate is rotated across successive process zones to achieve ultra-fast and high-precision thin film deposition. We present our latest results obtained with our novel C2R spatial ALD system, including the fabrication of SiO2, Ta2O5 and Al2O3 with deposition rates reaching > 1 µm/h. We also show that these materials exhibit low surface roughness (<1 Å RMS), low optical loss (<10 ppm @ 1064 nm), excellent uniformity (< 2% over 200 mm) and high damage threshold (up to 40 J/cm2).
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