CONFERENCE PROCEEDINGS
Advanced Search
Home > Proceedings > Volume PC12497 > Article
Presentation
30 April 2023 Development of nanoimprint templates for dual damascene processing
Takaharu Nagai, Hisayoshi Watanabe, Koji Ichimura
Author Affiliations +
Proceedings Volume PC12497, Novel Patterning Technologies 2023; PC1249708 (2023) https://doi.org/10.1117/12.2661643
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States
Abstract
Nanoimprint lithography, NIL, has been developed for semiconductor lithography technology. Recently, cost-effective process for metal interconnects is one of the main challenges to keep scaling at a certain range of cost. Since NIL has the advantage on the resolution of interconnect patterns without design restriction and potential of transferring three-dimensional shapes, dual damascene by NIL which realize the process of metal interconnects and vias with single lithography step has been proposed. In this presentation, we will discuss the performance of our template for dual damascene processing targeting sub 20nm half pitch.
Conference Presentation
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation Download Citation
Takaharu Nagai, Hisayoshi Watanabe, and Koji Ichimura "Development of nanoimprint templates for dual damascene processing", Proc. SPIE PC12497, Novel Patterning Technologies 2023, PC1249708 (30 April 2023); https://doi.org/10.1117/12.2661643
ACCESS THE FULL ARTICLE
ORGANIZATIONAL
Sign in with credentials provided by your organization.
INSTITUTIONAL
Select your institution to access the SPIE Digital Library.
SELECT YOUR INSTITUTION
PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
PERSONAL SIGN IN
No SPIE Account? Create one
;
PURCHASE THIS CONTENT
SUBSCRIBE TO DIGITAL LIBRARY
50 downloads per 1-year subscription
Members: $195
Non-members: $335 ADD TO CART
25 downloads per 1 - year subscription
Members: $145
Non-members: $250 ADD TO CART
PURCHASE SINGLE ARTICLE
Includes PDF, HTML & Video, when available
Members: $17.00
Non-members: $21.00 ADD TO CART
PROCEEDINGS
 PRESENTATION
WATCH
PRESENTATION SAVE TO MY LIBRARY
GET CITATION
Advertisement
Advertisement
KEYWORDS
Nanoimprint lithography
Lithography
Metals
3D acquisition
Double patterning technology
Extreme ultraviolet
Extreme ultraviolet lithography
RELATED CONTENT
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top