High-NA EUV platform realization as next step in EUV technology

Jara Garcia-Santaclara; Rudy Peeters; Jeroen van Dongen; Rob van Ballegoij; Sjoerd Lok; Jan van Schoot; Paul Graeupner; Peter Kuerz; Joerg Mallmann; Greet Stoorms; Peter Vanoppen

doi:10.1117/12.2687756

22 November 2023 High-NA EUV platform realization as next step in EUV technology

Jara Garcia-Santaclara, Rudy Peeters, Jeroen van Dongen, Rob van Ballegoij, Sjoerd Lok, Jan van Schoot, Paul Graeupner, Peter Kuerz, Joerg Mallmann, Greet Stoorms, Peter Vanoppen

Author Affiliations +

Proceedings Volume PC12750, International Conference on Extreme Ultraviolet Lithography 2023; PC1275002 (2023) https://doi.org/10.1117/12.2687756
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Abstract

To enable cost-effective scaling of technology nodes and extend Moore’s law for at least another decade, ASML has been developing the High NA EUV platform. With an increase of the numerical aperture (NA) from 0.33NA to 0.55NA, High NA EUV will bring multiple benefits to the semiconductor market, such as reduction of process complexity, yield improvement and higher resolution. This will be done while maximizing 0.33NA(NXE) and 0.55 NA (EXE) platforms commonality, making this an evolutionary step on EUV technology. This paper gives an overview of the progress and status of the first High NA EUV platform, the EXE:5000, through its different development and build phases.

Conference Presentation

Citation Download Citation

Jara Garcia-Santaclara, Rudy Peeters, Jeroen van Dongen, Rob van Ballegoij, Sjoerd Lok, Jan van Schoot, Paul Graeupner, Peter Kuerz, Joerg Mallmann, Greet Stoorms, and Peter Vanoppen "High-NA EUV platform realization as next step in EUV technology", Proc. SPIE PC12750, International Conference on Extreme Ultraviolet Lithography 2023, PC1275002 (22 November 2023); https://doi.org/10.1117/12.2687756

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
PRESENTATION

WATCH
PRESENTATION SAVE TO MY LIBRARY

GET CITATION

KEYWORDS

Extreme ultraviolet

Design and modelling

Extreme ultraviolet lithography

Prototyping

Reticles

Scanners

Semiconducting wafers

Show All Keywords

Keywords/Phrases

Search In:

Publication Years