Presentation
13 March 2024 3D nanopatterning of volumetric lenses, waveguides, and metamaterials enabling ultra-dense, on-chip 3D optics
Author Affiliations +
Abstract
Here, we present Subsurface Controllable Refractive Index via Beam Exposure (SCRIBE), a direct-write lithographic approach that enables the fabrication of volumetric microscale gradient refractive index lenses, waveguides, and metamaterials. The basis of SCRIBE is multiphoton polymerization inside monomer-filled nanoporous silicon and silica scaffolds. Adjusting the laser exposure during printing enables 3D submicron control of the polymer infilling and thus the refractive index over a range of greater than 0.3 and chromatic dispersion tuning. A Luneburg lens operating at visible wavelengths, achromatic doublets, multicomponent optics, photonic nanojets and subsurface 3D waveguides were all formed.
Conference Presentation
© (2024) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Paul V. Braun "3D nanopatterning of volumetric lenses, waveguides, and metamaterials enabling ultra-dense, on-chip 3D optics", Proc. SPIE PC12896, Photonic and Phononic Properties of Engineered Nanostructures XIV, PC1289601 (13 March 2024); https://doi.org/10.1117/12.3011437
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KEYWORDS
Waveguides

Lenses

Nanostructures

Optical metamaterials

Refractive index

Printing

Nonimpact printing

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