Phase imaging results of phase defect using micro-coherent extreme ultraviolet scatterometry microscope

Tetsuo Harada; Hiraku Hashimoto; Tsuyoshi Amano; Hiroo Kinoshita; Takeo Watanabe

doi:10.1117/1.JMM.15.2.021007

18 February 2016 Phase imaging results of phase defect using micro-coherent extreme ultraviolet scatterometry microscope

Tetsuo Harada, Hiraku Hashimoto, Tsuyoshi Amano, Hiroo Kinoshita, Takeo Watanabe

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 15, Issue 2, 021007 (February 2016). https://doi.org/10.1117/1.JMM.15.2.021007

Abstract

To evaluate defects on extreme ultraviolet (EUV) masks at the blank state of manufacturing, we developed a micro-coherent EUV scatterometry microscope (micro-CSM). The illumination source is coherent EUV light with a 140 nm focus diameter on the defect using a Fresnel zone plate. This system directly observes the reflection and diffraction signals from a phase defect. The phase and the intensity image of the defect are reconstructed with the diffraction images using ptychography, which is an algorithm of the coherent diffraction imaging. We observed programmed phase defect on a blank EUV mask. Phase distributions of these programmed defects were well reconstructed quantitatively. The micro-CSM is a very powerful tool to review an EUV phase defect.

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Tetsuo Harada, Hiraku Hashimoto, Tsuyoshi Amano, Hiroo Kinoshita, and Takeo Watanabe "Phase imaging results of phase defect using micro-coherent extreme ultraviolet scatterometry microscope," Journal of Micro/Nanolithography, MEMS, and MOEMS 15(2), 021007 (18 February 2016). https://doi.org/10.1117/1.JMM.15.2.021007

Published: 18 February 2016

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