Blazed binary diffractive gratings with antireflection coating for improved operation at 10.6 µm

Mane-Si Laure Lee; Pierre Legagneux; Philippe Lalanne; Jean-Claude Rodier; Patrick Gallais; Chantal Germain; Joël Rollin

doi:10.1117/1.1802253

1 November 2004 Blazed binary diffractive gratings with antireflection coating for improved operation at 10.6 μm

Mane-Si Laure Lee, Pierre Legagneux, Philippe Lalanne, Jean-Claude Rodier, Patrick Gallais, Chantal Germain, Joël Rollin

Author Affiliations +

Optical Engineering, Vol. 43, Issue 11, (November 2004). https://doi.org/10.1117/1.1802253

Abstract

We report on the design fabrication and characterization a 3-λperiod grating composed of subwavelength ridges of progressively varying widths for operation at 10.6 μm. The grating is blazed into the first transmitted order (an efficiency of 80% is measured) under TM polarization and over a broad range of angles of incidence. The fabrication involves contact photolithography, reactive-ion etching, and an evaporation deposition over the etched structure. The result validates the use of photolithography, a low-cost technology, for the manufacture of efficient blazed binary diffractive elements for thermal imaging (the 8- to 12-μm IR band).

©(2004) Society of Photo-Optical Instrumentation Engineers (SPIE)

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Mane-Si Laure Lee, Pierre Legagneux, Philippe Lalanne, Jean-Claude Rodier, Patrick Gallais, Chantal Germain, and Joël Rollin "Blazed binary diffractive gratings with antireflection coating for improved operation at 10.6 μm," Optical Engineering 43(11), (1 November 2004). https://doi.org/10.1117/1.1802253

Published: 1 November 2004

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