Traditional surface metrology mainly focuses on measuring distances between the sensor and the workpiece to characterize the surface topography and gain insights into geometric properties of the workpiece. This involves quantifying features like roughness using standardized surface texture parameters of ISO 25178 and ISO 21920. However, these parameters may not always offer a comprehensive understanding of a surface's functional aspects. For certain applications that require a highly sensitive process monitoring, the distribution of the surface gradient can provide complementary information about the functionality of the surface. We present a study to establish a direct correlation between the angular-resolved scattering light distribution and the functional characteristics of surfaces. While the sensor principle is commonly used for process monitoring, the relationship between the angular distribution and the functional characteristics like wear, friction, and lubrication has not been widely examined. As a case study, cylinder liner surfaces representing a diverse range of surface topographies with high functional requirements are examined. Functional surface texture parameters are determined as a benchmark using both tactile and optical surface topography measuring instruments. The results emphasize the importance and opportunities of directly connecting the angular distribution data with functional characteristics.
Selective Laser-induced Etching (SLE) is a manufacturing process which enables the fabrication of three-dimensional parts from transparent materials with unique freedom of geometry and high precision. First, the outer contour of the part is inscribed in the material using focused ultrashort pulsed laser radiation. Second, the modified design is exposed from the bulk material using wet chemical etching. We analyze the possibility of using SLE for the machining of next generation fused silica ion traps suitable for quantum computing. Such ion traps require an enhanced functionality in combination with reduced error sources and a reproducible manufacturing process. Ion trap designs with three-dimensional features in the micrometer regime are developed to meet these requirements. Challenges of the SLE process arising from the ion trap design and its dimensions are discussed. Different process strategies to fabricate single ion trap components as well as complete ion traps are examined. We demonstrate that next generation ion traps can be machined using SLE and outline the way towards a fabrication on wafer level.
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