During last 20 years, great results in metamaterials and plasmonic nanostructures fabrication were obtained. However,
large ohmic losses in metals and mass production compatibility still represent the most serious challenge that obstruct
progress in the fields of metamaterials and plasmonics. Many recent research are primarily focused on developing
low-loss alternative materials, such as nitrides, II–VI semiconductor oxides, high-doped semiconductors, or
two-dimensional materials. In this work, we demonstrate that our perfectly fabricated silver films can be an effective
low-loss material system, as theoretically well-known. We present a fabrication technology of plasmonic and
metamaterial nanodevices on transparent (quartz, mica) and non-transparent (silicon) substrates by means of e-beam
lithography and ICP dry etch instead of a commonly-used focused ion beam (FIB) technology. We eliminate negative
influence of litho-etch steps on silver films quality and fabricate square millimeter area devices with different topologies
and perfect sub-100 nm dimensions reproducibility. Our silver non-damage fabrication scheme is tested on trial
manufacture of spasers, plasmonic sensors and waveguides, metasurfaces, etc. These results can be used as a flexible
device manufacture platform for a broad range of practical applications in optoelectronics, communications,
photovoltaics and biotechnology.
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