This paper describes the preliminary analysis and design of a water-cooled multilayer monochromator (MLM) system for the Illinois Institute of Technology’s BioCAT beamline at Argonne National Laboratory. The first substrate is designed to handle the heat load of an undulator beam with low tangential slope errors. The substrates will each have two multilayer coating strips to provide high flux 12 keV beams with either 0.5% or 1% spectral bandwidth. The new multilayer system which will be added to the beamline is expected to provide an increased photon flux of 50 to 100 times compared with the existing double crystal monochromator system and thus enhance beamline throughput and performance for applications where higher bandwidth is acceptable.
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