Duplicated templates from a patterned silicon master were studied. The pattern was fabricated on a silicon wafer by
rotary electron beam (EB) writer and reactive ion etching (RIE). 2.5-inch full surface discrete track media (DTM)
templates of TP70nm supporting skewed servo patterns and discrete tracks were fabricated. The pattern on the silicon
master was successfully transferred to quartz templates by UV nanoimprint lithography (NIL) and RIE using a specially
prepared UV-NIL resist. TP60nm pattern fabrication was also accomplished by this same hard mask-less method. Servo
pattern printing (SPP) was used to investigate the repeatable run-out (RRO) of servo patterns. Nickel molds and quartz
templates were duplicated from the same silicon master by their respective processes and their RROs compared. It was
found that the duplication process (quartz or nickel) influenced the RRO profile and that the quartz NIL process did not
significantly degrade RRO.
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