Mr. Byoung-Sub Nam Profile

Byoung-Sub Nam

at SK Hynix Inc

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 20 March 2018 Presentation + Paper

Model based cell-array OPC development for productivity improvement in memory device fabrication

Ahmed Seoud, Sherif Hany, Juhwan Kim, Jebum Yoon, Boram Jung, Sang-Jin Oh, Byoung-Sub Nam, Seyoung Oh, Chan-Ha Park

Proceedings Volume 10587, 105870K (2018) https://doi.org/10.1117/12.2297638

KEYWORDS: Optical proximity correction, Lithography, SRAF, Semiconducting wafers, Photomasks, Manufacturing, Computer simulations

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Proceedings Article | 13 March 2012 Paper

Consideration for application of NTD from OPC and simulation perspective

Mihye Kim, James Moon, Byoung-sub Nam, Se-young Oh, Hyun-jo Yang, Donggyu Yim

Proceedings Volume 8326, 83262C (2012) https://doi.org/10.1117/12.916137

KEYWORDS: Optical proximity correction, Photomasks, Photoresist processing, Process modeling, Semiconductors, Lithography, Optical lithography, Calibration, Source mask optimization, Extreme ultraviolet lithography

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Proceedings Article | 23 March 2011 Paper

Study of various RET for process margin improvement in 3Xnm DRAM contact

Hak-Yong Sim, Hyoung-Soon Yune, Yeong-Bae Ahn, James Moon, Byoung-Sub Nam, Donggyu Yim, Sung-Ki Park

Proceedings Volume 7973, 79732N (2011) https://doi.org/10.1117/12.879206

KEYWORDS: Photomasks, Resolution enhancement technologies, Electroluminescence, Optical lithography, Semiconducting wafers, Mask making, Scanning electron microscopy, Lithography, Double patterning technology, Image processing

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Proceedings Article | 11 December 2009 Paper

Comparison of simulation and wafer results for shadowing and flare effect on EUV alpha demo tool

James Moon, Cheol-Kyun Kim, Byoung-Sub Nam, Byong-Ho Nam, Chang-Moon Lim, Donggyu Yim, Sung-Ki Park

Proceedings Volume 7520, 75200T (2009) https://doi.org/10.1117/12.837136

KEYWORDS: Semiconducting wafers, Extreme ultraviolet, Critical dimension metrology, Extreme ultraviolet lithography, Photomasks, Scanning electron microscopy, Wafer testing, Lithography, Calibration, Point spread functions

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Proceedings Article | 20 March 2009 Paper

Evaluation of shadowing and flare effect for EUV tool

James Moon, Cheol-Kyun Kim, Byoung-Sub Nam, Byoung-Ho Nam, Yoon-Suk Hyun, Suk-Kyun Kim, Chang-Moon Lim, Yong-Dae Kim, Mun-Sik Kim, Yong-Kyoo Choi, Chang-Reol Kim, Donggyu Yim

Proceedings Volume 7271, 727144 (2009) https://doi.org/10.1117/12.814364

KEYWORDS: Extreme ultraviolet, Critical dimension metrology, Extreme ultraviolet lithography, Semiconducting wafers, Lithography, Photomasks, Scanning electron microscopy, Wafer testing, Silicon, Light scattering

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Proceedings Article | 4 December 2008 Paper

CD uniformity improvement of sub 60nm contact hole using model based OPC

Hyoung-Soon Yune, Yeong-Bae Ahn, Jung-Chan kim, Hye-Jin Shin, Gyun Yoo, James Moon, Byoung-Sub Nam, Donggyu Yim

Proceedings Volume 7140, 71403E (2008) https://doi.org/10.1117/12.804654

KEYWORDS: Optical proximity correction, Critical dimension metrology, Model-based design, Data modeling, Calibration, Semiconducting wafers, Photomasks, Resolution enhancement technologies, Etching, Instrument modeling

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Proceedings Article | 19 March 2008 Paper

DFM application on dual tone sub 50nm device

Byoung-Sub Nam, James Moon, Joo-Hong Jung, Dong-Ho Kong, Se-young Oh, Cheol-Kyun Kim, Byung-Ho Nam, Dong Gyu Yim

Proceedings Volume 6925, 692514 (2008) https://doi.org/10.1117/12.772430

KEYWORDS: Photomasks, Design for manufacturing, Optical proximity correction, Semiconductors, Copper, Semiconducting wafers, Data modeling, Lithographic illumination, Electroluminescence, Optical lithography

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Proceedings Article | 7 March 2008 Paper

Binary and attenuated PSM mask evaluation for sub 50nm device development perspective

James Moon, Byoung-Sub Nam, Joo-Hong Jeong, Dong-Ho Kong, Byung-Ho Nam, Dong Gyu Yim

Proceedings Volume 6924, 692436 (2008) https://doi.org/10.1117/12.772492

KEYWORDS: Photomasks, Binary data, Semiconducting wafers, Electroluminescence, Bismuth, Semiconductors, Laser applications, Lithography, Chromium, Scanning electron microscopy

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Proceedings Article | 21 March 2007 Paper

Self-assembled dummy patterns for lithography process margin enhancement

James Moon, Byoung-Sub Nam, Joo-Hong Jeong, Byung-Ho Nam, Dong Gyu Yim

Proceedings Volume 6521, 652118 (2007) https://doi.org/10.1117/12.711253

KEYWORDS: Lithography, Design for manufacturing, Optical proximity correction, Printing, Semiconducting wafers, Inspection, Data modeling, Photomasks, Semiconductors, Design for manufacturability

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Proceedings Article | 7 June 1996 Paper

Effect of numerical aperture and partial coherence to the resist sidewall angle

Hye-Keun Oh, Byoung Sub Nam, So-Yeon Baek

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240976

KEYWORDS: Absorption, Photoresist processing, Lithography, Physics, Image enhancement, Chemistry, Radon, Electronics

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Proceedings Article | 17 May 1994 Paper

Exposure of a halftone mask by conventional and off-axis illumination

Hye-Keun Oh, Jung-Woung Goo, Sug-Soon Yim, Tak-Hyun Yoon, Seung-Wook Park, Byoung Sub Nam, Hoyoung Kang, Cheol-Hong Kim, Woo-Sung Han

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175421

KEYWORDS: Halftones, Photomasks, Binary data, Lithography, Phase shifting, Lithographic illumination, Computer simulations, Optical lithography, Photoresist processing, X-ray technology

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Showing 5 of 11 publications

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