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Charlotte Bouet
at CEA-Grenoble
SPIE Involvement:
Author
Publications (3)
Proceedings Article | 3 April 2020 Paper
Establishing a sidewall image transfer chemo-epitaxial DSA process using 193 nm immersion lithography
G. Rademaker, A. Le Pennec, T. Giammaria, K. Benotmane, H. Pham, C. Bouet, M. G. Gusmao Cacho, M. Argoud, M.-L. Pourteau, A. Paquet, A. Gharbi, C. Navarro, C. Nicolet, X. Chevalier, K. Sakavuyi, P. Nealey, R. Tiron
Proceedings Volume 11326, 113260Z (2020) https://doi.org/10.1117/12.2552003
KEYWORDS: Lithography, Metrology, Directed self assembly, Immersion lithography, Photomasks, Optical lithography, Etching, Critical dimension metrology, Semiconducting wafers
Proceedings Article | 25 March 2020 Paper
Block copolymer line roughness measurement via PSD: application to fingerprint samples
Aurélie Le Pennec, Jérôme Rêche, Patrick Quéméré, Guido Rademaker, Romain Jarnias, Charlotte Bouet, Célia Nicolet, Christophe Navarro, Maxime Argoud, Raluca Tiron
Proceedings Volume 11326, 113261I (2020) https://doi.org/10.1117/12.2551854
KEYWORDS: Line width roughness, Ultraviolet radiation, Edge detection, Polymethylmethacrylate, Directed self assembly, Binary data, Polymerization, Statistical analysis, Software development
Proceedings Article | 23 March 2020 Paper
Expanding DSA process window with atmospheric control
Nathalie Frolet, Maxime Argoud, Charlotte Bouet, Karine Jullian, Yuji Tanaka, Chisayo Mori, You Arisawa, Tomohiro Motono, Masahiko Harumoto, Harold Stokes, Masaya Asai, Raluca Tiron
Proceedings Volume 11326, 113261J (2020) https://doi.org/10.1117/12.2561259
KEYWORDS: Oxygen, Annealing, Directed self assembly, Control systems, Materials processing, Oxidation
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