Identifying hotspots--structures that limit the lithography process window--become increasingly important as the
industry relies heavily on RET to print sub-wavelength designs. KLA-Tencor's patented Process Window Qualification
(PWQ) methodology has been used for this purpose in various fabs. PWQ methodology has three key advantages (a)
PWQ Layout--to obtain the best sensitivity (b) Design Based Binning--for pattern repeater analysis (c) Intelligent
sampling--for the best DOI sampling rate. This paper evaluates two different analysis strategies for SEM review
sampling successfully deployed at Inotera Memories, Inc. We propose a new approach combining the location repeater
and pattern repeaters. Based on a recent case study the new sampling flow reduces the data analysis and sampling time
from 6 hours to 1.5 hour maintaining maximum DOI sample rate.
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