David H. Kim
Product Solution Sales Manager at Synopsys Korea Inc
SPIE Involvement:
Author
Publications (24)

Proceedings Article | 31 March 2014 Paper
Guangming Xiao, Kevin Hooker, Dave Irby, Yunqiang Zhang, Brian Ward, Tom Cecil, Brett Hall, Mindy Lee, Dave Kim, Kevin Lucas
Proceedings Volume 9052, 90522D (2014) https://doi.org/10.1117/12.2048022
KEYWORDS: Photomasks, Lithography, Optical lithography, Optical proximity correction, Chromium, Model-based design, Logic, Optimization (mathematics), Semiconducting wafers, Critical dimension metrology

Proceedings Article | 1 October 2013 Paper
Proceedings Volume 8880, 88801U (2013) https://doi.org/10.1117/12.2026140
KEYWORDS: Optical proximity correction, Image quality, Optimization (mathematics), Nanoimprint lithography, Image enhancement, Image processing, Design for manufacturing, Resolution enhancement technologies, Neodymium, Nano opto mechanical systems

Proceedings Article | 14 October 2011 Paper
Proceedings Volume 8166, 81660J (2011) https://doi.org/10.1117/12.896981
KEYWORDS: Extreme ultraviolet, Photomasks, Calibration, Scanning electron microscopy, Inspection, Image processing, Defect detection, Computational lithography, Image analysis, Transmission electron microscopy

Proceedings Article | 4 April 2011 Paper
Jaeyoon Jeong, Seokyun Jeong, Changhoon Ahn, Yongsun Jang, Sukjoo Lee, Thomas Cecil, Donghwan Son, Tatung Chow, David Kim
Proceedings Volume 7974, 797409 (2011) https://doi.org/10.1117/12.879393
KEYWORDS: Photomasks, Lithography, Optical proximity correction, Source mask optimization, Photovoltaics, Optical lithography, Optimization (mathematics), Detection and tracking algorithms, Electroluminescence, Semiconducting wafers

Proceedings Article | 23 March 2011 Paper
Yeon-Ah Shim, Sungho Jun, Jaeyoung Choi, Kwangseon Choi, Jae-won Han, Kechang Wang, John McCarthy, Guangming Xiao, Grace Dai, DongHwan Son, Xin Zhou, Tom Cecil, David Kim, Ki-Ho Baik
Proceedings Volume 7973, 79732S (2011) https://doi.org/10.1117/12.870704
KEYWORDS: Lithography, SRAF, Photomasks, Image processing, Optical lithography, Optical proximity correction, Semiconducting wafers, Resolution enhancement technologies, Overlay metrology, Logic

Proceedings Article | 23 March 2011 Paper
Proceedings Volume 7973, 79731C (2011) https://doi.org/10.1117/12.882814
KEYWORDS: Photomasks, Lithography, Optical proximity correction, Manufacturing, SRAF, Image segmentation, Inverse problems, Optimization (mathematics), Electronics, Electroluminescence

Proceedings Article | 23 March 2011 Paper
Proceedings Volume 7973, 79731L (2011) https://doi.org/10.1117/12.879781
KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Photovoltaics, Data modeling, Lithography, SRAF, Calibration, Nanoimprint lithography, Resolution enhancement technologies

Proceedings Article | 29 September 2010 Paper
Guangming Xiao, Dave Irby, Tom Cecil, David Kim, Shuichiro Ohara, Isao Aburatani
Proceedings Volume 7823, 78233T (2010) https://doi.org/10.1117/12.866131
KEYWORDS: Photomasks, SRAF, Vestigial sideband modulation, Optical alignment, Critical dimension metrology, Lithography, Optical proximity correction, Photovoltaics, Resolution enhancement technologies, Image segmentation

Proceedings Article | 29 September 2010 Paper
Proceedings Volume 7823, 782311 (2010) https://doi.org/10.1117/12.864528
KEYWORDS: SRAF, Optical proximity correction, Scanning electron microscopy, Calibration, Diffusion, Photomasks, Lithography, Performance modeling, Cadmium sulfide, Critical dimension metrology

Proceedings Article | 25 September 2010 Paper
Aki Fujimura, David Kim, Ingo Bork, Christophe Pierrat
Proceedings Volume 7823, 78230R (2010) https://doi.org/10.1117/12.864184
KEYWORDS: Photomasks, SRAF, Semiconducting wafers, Vestigial sideband modulation, Lithography, Scanning electron microscopy, Printing, Beam shaping, Optical proximity correction, Line edge roughness

Proceedings Article | 27 May 2010 Paper
Proceedings Volume 7748, 77480V (2010) https://doi.org/10.1117/12.866413
KEYWORDS: Photomasks, Semiconducting wafers, SRAF, Vestigial sideband modulation, Scanning electron microscopy, Logic, Lithography, Manufacturing, Error analysis, Light sources

Proceedings Article | 26 May 2010 Paper
Proceedings Volume 7748, 77481T (2010) https://doi.org/10.1117/12.867995
KEYWORDS: SRAF, Photomasks, Image segmentation, Lithography, Control systems, Stereolithography, Critical dimension metrology, Electron beam lithography, Manufacturing, Resolution enhancement technologies

Proceedings Article | 30 September 2009 Paper
Byung-Gook Kim, Sung Soo Suh, Sang Gyun Woo, HanKu Cho, Guangming Xiao, Dong Hwan Son, Dave Irby, David Kim, Ki-Ho Baik
Proceedings Volume 7488, 748812 (2009) https://doi.org/10.1117/12.833572
KEYWORDS: Photomasks, Inspection, Lithography, Manufacturing, SRAF, Optical proximity correction, Image segmentation, Error analysis, Resolution enhancement technologies, Scanning electron microscopy

Proceedings Article | 23 September 2009 Paper
Yeonah Shim, Sungho Jun, Jaeyoung Choi, Kwangseon Choi, Jae-won Han, Kechang Wang, John McCarthy, Guangming Xiao, Grace Dai, DongHwan Son, Xin Zhou, Thomas Cecil, David Kim, KiHo Baik
Proceedings Volume 7488, 748837 (2009) https://doi.org/10.1117/12.833499
KEYWORDS: Lithography, SRAF, Photomasks, Optical lithography, Image processing, Lithographic illumination, Optical proximity correction, Resolution enhancement technologies, Scanners, Computer simulations

Proceedings Article | 23 September 2009 Paper
Proceedings Volume 7488, 748809 (2009) https://doi.org/10.1117/12.830034
KEYWORDS: Photomasks, Inspection, Defect inspection, Lithography, SRAF, Image classification, Wafer-level optics, Semiconducting wafers, Defect detection, Scanning electron microscopy

Proceedings Article | 9 June 2009 Paper
Proceedings Volume 7379, 73791M (2009) https://doi.org/10.1117/12.824299
KEYWORDS: Photomasks, Lithography, Inspection, Logic, Manufacturing, Optical proximity correction, Model-based design, Scanning electron microscopy, Image processing, Systems modeling

Proceedings Article | 7 March 2008 Paper
Proceedings Volume 6924, 692438 (2008) https://doi.org/10.1117/12.772515
KEYWORDS: Photomasks, Optical proximity correction, Lithography, Manufacturing, SRAF, Scanners, Atrial fibrillation, Calibration, Optimization (mathematics), Distance measurement

Proceedings Article | 16 November 2007 Paper
Proceedings Volume 6730, 67303O (2007) https://doi.org/10.1117/12.747180
KEYWORDS: Inspection, SRAF, Photomasks, Semiconducting wafers, Optical proximity correction, Mask making, Electronics, Critical dimension metrology, Printing, Sensors

Proceedings Article | 30 October 2007 Paper
David Kim, Venu Vellanki, William Huang, Andrew Cao, Chunlin Chen, Aditya Dayal, Paul Yu, Ki Hun Park, Yumiko Maenaka, Kazuko Jochi, Gregg Inderhees
Proceedings Volume 6730, 67305M (2007) https://doi.org/10.1117/12.747163
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Cameras, Deep ultraviolet, Lithography, Etching, Reticles, Fiber optic illuminators

Proceedings Article | 25 October 2007 Paper
Proceedings Volume 6730, 673024 (2007) https://doi.org/10.1117/12.746567
KEYWORDS: Inspection, SRAF, Photomasks, Reticles, Optical proximity correction, Defect inspection, Databases, Opacity, Semiconducting wafers, Defect detection

Proceedings Article | 15 May 2007 Paper
KangJoon Seo, SangIee Lee, HyunYoung Kim, DaeHo Hwang, Sangpyo Kim, Goomin Jeong, Oscar Han, Chunlin Chen, David Yee, EunJi Kim, KiHun Park, NamWook Kim, Sunny Choi, David Kim, Shrinkant Lohokare
Proceedings Volume 6607, 66072D (2007) https://doi.org/10.1117/12.728996
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Reticles, Tolerancing, Scanning electron microscopy, Lithography, Manufacturing, Printing, Critical dimension metrology

Proceedings Article | 20 October 2006 Paper
Hyun Young Kim, Dae Ho Hwang, Sang Pyo Kim, Oscar Han, Ki Hun Park, Nam Wook Kim, David Kim
Proceedings Volume 6349, 63493Q (2006) https://doi.org/10.1117/12.702033
KEYWORDS: Inspection, Antimony, Etching, Algorithm development, Calibration, Defect detection, Chromium, Reflectivity, Critical dimension metrology, Photomasks

Proceedings Article | 4 November 2005 Paper
Proceedings Volume 5992, 599209 (2005) https://doi.org/10.1117/12.632338
KEYWORDS: Inspection, Defect detection, Photomasks, Contamination, Binary data, Defect inspection, Nanoimprint lithography, Deep ultraviolet, Semiconducting wafers, Mask making

Proceedings Article | 4 November 2005 Paper
Won Kim, Mark Eickhoff, David Kim, Sandy McCurley
Proceedings Volume 5992, 59920C (2005) https://doi.org/10.1117/12.632322
KEYWORDS: Inspection, Photomasks, Contamination, Reticles, Semiconducting wafers, SRAF, Manufacturing, Resolution enhancement technologies, Lithography, Sensors

Showing 5 of 24 publications
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