Dr. David Kuo Profile

Dr. David Kuo

Senior Director/Technologist at Seagate Technology LLC

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Publications (6)

Proceedings Article | 19 March 2015 Paper

Imprint directed self-assembly of cylinder-forming Si-containing block copolymer for 6nm half-pitch line patterning

Shuaigang Xiao, XiaoMin Yang, Yautzong Hsu, Kim Lee, David Kuo

Proceedings Volume 9423, 94230O (2015) https://doi.org/10.1117/12.2085986

KEYWORDS: Picosecond phenomena, Oxygen, Reactive ion etching, Optical lithography, Nanoimprint lithography, Etching, Plasma, Polymers, Plasma etching, Directed self assembly

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SPIE Journal Paper | 12 August 2014 Open Access

Fabrication of servo-integrated template for 1.5 Teradot/inch² bit patterned media with block copolymer directed assembly

XiaoMin Yang, Shuaigang Xiao, Yautzong Hsu, HongYing Wang, Justin Hwu, Philip Steiner, Koichi Wago, Kim Lee, David Kuo

JM3, Vol. 13, Issue 03, 031307, (August 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.3.031307

KEYWORDS: Servomechanisms, Beam propagation method, Scanning electron microscopy, Quartz, Magnetism, Nanoimprint lithography, Etching, Optical lithography, Lithography, Directed self assembly

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SPIE Journal Paper | 2 August 2013 Open Access

Directed self-assembly for high-density bit-patterned media fabrication using spherical block copolymers

Shuaigang Xiao, XiaoMin Yang, Kim Lee, Justin Hwu, Koichi Wago, David Kuo

JM3, Vol. 12, Issue 03, 031110, (August 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.3.031110

KEYWORDS: Spherical lenses, Magnetism, Picosecond phenomena, Servomechanisms, Quartz, Beam propagation method, Lithography, Nanoimprint lithography, Reactive ion etching, Directed self assembly

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SPIE Journal Paper | 13 September 2012

Cleaning induced imprint template erosion

SherJang Singh, Zhaoning Yu, Nobuo Kurataka, Gene Gauzner, Hongying Wang, Henry Yang, Yautzong Hsu, Kim Lee, David Kuo, Tobias Wähler, Peter Dress

JM3, Vol. 11, Issue 3, 031407, (September 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.3.031407

KEYWORDS: Scanning probe microscopy, Beam propagation method, Contamination, Scanning electron microscopy, Silica, Inspection, Nanoimprint lithography, Hydrogen, Particles, Critical dimension metrology

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Proceedings Article | 21 March 2012 Paper

Controlling template erosion with advanced cleaning methods

SherJang Singh, Zhaoning Yu, Tobias Wähler, Nobuo Kurataka, Gene Gauzner, Hongying Wang, Henry Yang, Yautzong Hsu, Kim Lee, David Kuo, Peter Dress

Proceedings Volume 8323, 832317 (2012) https://doi.org/10.1117/12.916294

KEYWORDS: Scanning probe microscopy, Beam propagation method, Contamination, Silica, Scanning electron microscopy, Critical dimension metrology, Nanoimprint lithography, Particles, Inspection, Image analysis

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Proceedings Article | 23 September 2009 Paper

SEM CD metrology on nanoimprint template: an analytical SEM approach

Justin Hwu, Sergey Babin, Lorena Page, Alex Danilevsky, Andy Self, Kazuhiro Ueda, Shunzuke Koshihara, Koichi Wago, Kim Lee, David Kuo

Proceedings Volume 7488, 74881W (2009) https://doi.org/10.1117/12.830699

KEYWORDS: Scanning electron microscopy, Image processing, Image analysis, Metrology, Line width roughness, Critical dimension metrology, Monte Carlo methods, Transmission electron microscopy, Quartz, Process modeling

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Critical dimension metrology is the most needed feedback in nanofabrication and automatic CDSEM-based methods are by far the industrial standard for its well-established methodology and ease of programming and flexibility in measurement setup and operation. The dimensional measurements from SEMs consist of two steps, the first being the pixel based electron emission signal intensity profile generation and the second being the algorithm treatment on the generated intensity profile for the dimension determination. However, SEM metrology involves uncertainty of the measurement in the signal processing step, because the SEM signal formation is an extremely complex process depending on the pattern geometry, materials, detector setup, and beam voltage. Analytical SEMs are even less optimized for the task of quantitative metrology, especially at the CD ranging below 100 nm. In this work, we used an analytical SEM for CD metrology applications on quartz nanoimprint template from the perspective that only analytical SEM is accessible. The machine was tuned and beam characterization was done first to find the best reasonable condition for consistent manual operation using BEAMETR beam measurement pattern and software. The optimized beam condition set was then used for image collection on pitch pattern quartz template and the measurements were done using regular imaging processing and physical model based processing tool myCD. In order to discuss the spot size on the scan signal and the resulting influence on CD measurements, we used CHARIOT simulation software for simulated intensity profile as demonstration. The quartz template was then measured through a mask CDSEM for final data comparison. Selected sites were cross sectioned to reveal profile information as metrology comparison reference. Through our exercise, the metrology capability and fundamental limitation of analytical SEM operation with regular imaging processing was identified and the improvement using the physical modeling imaging process was verified.

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