Dr. Fatima Anis Profile

Dr. Fatima Anis

Research Scientist at KLA Corp

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Publications (13)

Proceedings Article | 27 April 2023 Presentation + Paper

Multi-metrology: towards parametric yield predictions beyond EPE

Franz Zach, Srividya Cancheepuram, Kaushik Sah, Roel Gronheid, Fatima Anis

Proceedings Volume 12496, 124960P (2023) https://doi.org/10.1117/12.2658042

KEYWORDS: Etching, Line edge roughness, Semiconducting wafers, Overlay metrology, 3D modeling, Scanning electron microscopy, Logic, Yield improvement, Optical lithography

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Variability control has been a key enabler for achieving continuing technology shrinks in both logic as well as DRAM. With ever-tightening requirements, simple one-dimensional metrology and control aspects, i.e. separate variability control for CD and overlay, are no longer adequate [1]. To improve on this approach, simultaneous control of more than one parameter has been discussed to minimize the parametric yield impact. One such example is to improve edge placement error (EPE), a metric where overlay and CD metrology are combined [1]. In this work, we will revisit the EPE concept from the perspective of using established methodologies used in yield modeling. Rather than starting with a litho-centric approach, we cast the problem as a parametric yield loss mechanism driven by patterning parameters. In contrast to the widely disseminated EPE budget that originates from a patterning process-centric view, we introduce a modified analysis framework. The development of the approach discussed in this work starts with well-known yield engineering approaches rooted in defectivity modeling/statistics. It then proceeds towards quantifying and thus allowing a statistically sound quantification and thus prioritization of patterning (i.e. litho or post etch) improvements based on their impact on the yield loss Pareto. In doing so, the new formalism sheds light on what aspects of the EPE distribution most prominently affects yield loss. It also reveals that the ratio of potentially failing instances with a die and the max number of fails tolerable before the die fails plays a role in formulating any kind of budget approach. When putting our concepts to the test we discovered that there is yet another significant contributor affecting the acceptable variation range. We find that the “rigid structure approach”, an inherent assumption in any budget breakdown, and feature-to-feature interactions drive a significant reduction of the available processing tolerances. We attribute this mechanism to the 3D aspects of the patterning process and present a model that can handle the interactions. Finally, we discuss our approach to addressing the fact that process variability happens on length scales that cover several orders of magnitude. We developed a physical budget breakdown that attempts to optimize the tradeoff between sample size and the ability to capture variability over this wide range of length scales. We will postpone our discussion on other sampling-related topics. The question of how one obtains all required metrology data on one wafer in a manufacturing environment will be addressed in a future publication.

Proceedings Article | 26 May 2022 Presentation + Paper

Model-less analysis method for characterizing overlay in EUV lithography

Roel Gronheid, Zhen Zhang, Woong Jae Chung, Fatima Anis, Franz Zach, Holger Bald, Boris Habets

Proceedings Volume 12053, 120530Y (2022) https://doi.org/10.1117/12.2617746

KEYWORDS: Semiconducting wafers, Principal component analysis, Overlay metrology, Extreme ultraviolet lithography, Infrared radiation, Extreme ultraviolet, Silicon, Reflectivity, Transmittance, Scanners

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Proceedings Article | 26 May 2022 Poster + Paper

Machine learning modeling using process context and exposure data for overlay prediction

W. H. Wang, Irina Brinster, Mohsen Maniat, Fatima Anis, Yen-Hui Lee, Sven Boese, C. F. Tseng, Wei-Yuan Chu, Boris Habets, C. H. Huang, Elvis Yang, T. H. Yang, K. C. Chen

Proceedings Volume 12053, 120531Q (2022) https://doi.org/10.1117/12.2613202

KEYWORDS: Semiconducting wafers, Overlay metrology, Data modeling, Metrology, Optical parametric oscillators, Performance modeling, Process modeling, Machine learning, Semiconductor manufacturing, Data processing

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Proceedings Article | 23 February 2021 Presentation

Identifying contributors to overlay variability using a model-less analysis method

Fatima Anis, ROEL GRONHEID, Dieter Dieter Van den Heuvel, Franz Zach

Proceedings Volume 11611, 116111D (2021) https://doi.org/10.1117/12.2584554

KEYWORDS: Overlay metrology, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Data modeling, Process control, Optical lithography, Metrology, Logic

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Proceedings Article | 16 March 2018 Paper

Yield impact for wafer shape misregistration-based binning for overlay APC diagnostic enhancement

David Jayez, Kevin Jock, Yue Zhou, Venugopal Govindarajulu, Zhen Zhang, Fatima Anis, Felipe Tijiwa-Birk, Shivam Agarwal

Proceedings Volume 10585, 105851B (2018) https://doi.org/10.1117/12.2302973

KEYWORDS: Semiconducting wafers, Overlay metrology, Lithography, Yield improvement, Scanners, Diagnostics, Process control, Manufacturing, Visualization

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Proceedings Article | 28 March 2017 Presentation + Paper

Patterned wafer geometry grouping for improved overlay control

Honggoo Lee, Sangjun Han, Jaeson Woo, Junbeom Park, Changrock Song, Fatima Anis, Pradeep Vukkadala, Sanghuck Jeon, DongSub Choi, Kevin Huang, Hoyoung Heo, Mark Smith, John Robinson

Proceedings Volume 10145, 101450O (2017) https://doi.org/10.1117/12.2257834

KEYWORDS: Semiconducting wafers, Overlay metrology, Metrology, Process control, Optical lithography, Semiconductor manufacturing, Control systems, Inspection, Tolerancing, Manufacturing, Seaborgium, Semiconductors, Optical alignment, Principal component analysis

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Proceedings Article | 17 March 2015 Paper

Breast ultrasound computed tomography using waveform inversion with source encoding

Kun Wang, Thomas Matthews, Fatima Anis, Cuiping Li, Neb Duric, Mark Anastasio

Proceedings Volume 9419, 94190C (2015) https://doi.org/10.1117/12.2082286

KEYWORDS: Computer programming, Breast, Ultrasonography, Acoustics, Stochastic processes, Reconstruction algorithms, Computed tomography, Spatial resolution, Transducers, Data acquisition

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Proceedings Article | 11 March 2015 Paper

Three-dimensional laser optoacoustic and laser ultrasound imaging system for biomedical research

Sergey Ermilov, Richard Su, Andre Conjusteau, Tanmayi Oruganti, Kun Wang, Fatima Anis, Mark Anastasio, Alexander Oraevsky

Proceedings Volume 9323, 93230N (2015) https://doi.org/10.1117/12.2085028

KEYWORDS: Imaging systems, Ultrasonography, 3D image processing, Absorption, Acoustics, Transducers, Laser systems engineering, Reconstruction algorithms, Kidney, Tomography

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Proceedings Article | 11 March 2015 Paper

Accelerated iterative image reconstruction in three-dimensional optoacoustic tomography

Fatima Anis, Kun Wang, Richard Su, Sergey Ermilov, Alexander Oraevsky, Mark Anastasio

Proceedings Volume 9323, 932315 (2015) https://doi.org/10.1117/12.2084087

KEYWORDS: Image restoration, Reconstruction algorithms, Transducers, 3D image processing, Tomography, Imaging systems, Image quality, Algorithm development, 3D modeling, Image analysis

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Proceedings Article | 3 March 2014 Paper

3D laser optoacoustic ultrasonic imaging system for research in mice (LOUIS-3DM)

Sergey Ermilov, Richard Su, Andre Conjusteau, Vassili Ivanov, Vyacheslav Nadvoretskiy, Tanmayi Oruganti, Pratik Talole, Fatima Anis, Mark Anastasio, Alexander Oraevsky

Proceedings Volume 8943, 89430J (2014) https://doi.org/10.1117/12.2044817

KEYWORDS: Ultrasonography, Imaging systems, Acoustics, 3D image processing, Transducers, Receivers, Tomography, Visualization, Reconstruction algorithms, Prototyping

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Proceedings Article | 3 March 2014 Paper

Investigation of the adjoint-state method for ultrasound computed tomography: a numerical and experimental study

Fatima Anis, Yang Lou, André Conjusteau, Richard Su, Tanmayi Oruganti, Sergey Ermilov, Alexander Oraevsky, Mark Anastasio

Proceedings Volume 8943, 894337 (2014) https://doi.org/10.1117/12.2042636

KEYWORDS: Ultrasonography, Reconstruction algorithms, Computed tomography, Imaging systems, Breast imaging, Biomedical optics, Transducers, CT reconstruction, Image restoration, Tomography

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Proceedings Article | 4 March 2013 Paper

Image reconstruction and system optimization for three-dimensional speed of sound tomography using laser-induced ultrasound

Fatima Anis, Richard Su, Vyacheslav Nadvoretsky, André Conjusteau, Sergey Ermilov, Alexander Oraevsky, Mark Anastasio

Proceedings Volume 8581, 85814T (2013) https://doi.org/10.1117/12.2008813

KEYWORDS: Imaging systems, Ultrasonography, Transducers, 3D image processing, Tomography, Image restoration, Receivers, Reconstruction algorithms, 3D modeling, Biomedical optics

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Proceedings Article | 4 March 2013 Paper

3D laser optoacoustic ultrasonic imaging system for preclinical research

Sergey Ermilov, André Conjusteau, Travis Hernandez, Richard Su, Vyacheslav Nadvoretskiy, Dmitri Tsyboulski, Fatima Anis, Mark Anastasio, Alexander Oraevsky

Proceedings Volume 8581, 85810N (2013) https://doi.org/10.1117/12.2008811

KEYWORDS: Ultrasonography, Imaging systems, Acoustics, 3D image processing, Tomography, Visualization, Signal attenuation, 3D modeling, Ultrasound tomography, Pre-clinical research

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Showing 5 of 13 publications

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