Mr. Goji Wakamatsu Profile

Goji Wakamatsu

at JSR Corp

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 27 March 2014 Paper

Spin-on organic hardmask for topo-patterned substrate

Kazuhiko Komura, Yoshi Hishiro, Goji Wakamatsu, Yoshio Takimoto, Tomoki Nagai, Tooru Kimura, Yoshikazu Yamaguchi, Tsutomu Shimokawa, Greg Breyta, Noel Arellano, Srinivasan Balakrishnan, Luisa Bozano, Ananthakrishnan Sankaranarayanan, Krishna Bajjuri, Daniel Sanders, Carl Larson, Anuja DeSilva, Martin Glodde

Proceedings Volume 9051, 905115 (2014) https://doi.org/10.1117/12.2046357

KEYWORDS: Fourier transforms, Chemical vapor deposition, Photoresist materials, Resistance, Carbon, Photomasks, Optical lithography, Lithography, Glasses

Read Abstract +

Proceedings Article | 20 March 2012 Paper

Investigation of pattern wiggling for spin-on organic hardmask materials

Goji Wakamatsu, Kentaro Goto, Yoshi Hishiro, Taiichi Furukawa, Satoru Murakami, Masayuki Motonari, Yoshikazu Yamaguchi, Tsutomu Shimokawa, Greg Breyta, Anuja DeSilva, Noel Arellano, Luisa Bozano, Carl Larson, Martin Glodde, Ratnam Sooriyakumaran

Proceedings Volume 8325, 83250T (2012) https://doi.org/10.1117/12.915698

KEYWORDS: Etching, Resistance, Hydrogen, Chemical vapor deposition, Fluorine, Fourier transforms, Optical lithography, Critical dimension metrology, Double patterning technology, Extreme ultraviolet

Read Abstract +

Proceedings Article | 26 March 2010 Paper

Simplified double patterning process with non-topcoat self-freezing resist

Tomohisa Fujisawa, Yusuke Anno, Masafumi Hori, Goji Wakamatsu, Michihiro Mita, Koji Ito, Hiromitsu Tanaka, Kenji Hoshiko, Takeo Shioya, Kentaro Goto, Yoshifumi Ogawa, Hiroaki Takikawa, Yutaka Kozuma, Koichi Fujiwara, Makoto Sugiura, Yoshikazu Yamaguchi, Tsutomu Shimokawa

Proceedings Volume 7639, 76392Y (2010) https://doi.org/10.1117/12.846493

KEYWORDS: Double patterning technology, Photoresist processing, Lithography, Manufacturing, Optical lithography, Silica, Water, Immersion lithography, Critical dimension metrology, Extreme ultraviolet lithography

Read Abstract +

Proceedings Article | 1 April 2009 Paper

Double patterning process with freezing technique

Goji Wakamatsu, Yusuke Anno, Masafumi Hori, Tomohiro Kakizawa, Michihiro Mita, Kenji Hoshiko, Takeo Shioya, Koichi Fujiwara, Shiro Kusumoto, Yoshikazu Yamaguchi, Tsutomu Shimokawa

Proceedings Volume 7273, 72730B (2009) https://doi.org/10.1117/12.814073

KEYWORDS: Double patterning technology, Lithography, Optical lithography, Photoresist processing, Manufacturing, Etching, Semiconducting wafers, Scanning electron microscopy, Image processing, Photomasks

Read Abstract +

Proceedings Article | 26 March 2008 Paper

Sub-40-nm half-pitch double patterning with resist freezing process

Masafumi Hori, Tomoki Nagai, Atsushi Nakamura, Takayoshi Abe, Gouji Wakamatsu, Tomohiro Kakizawa, Yuusuke Anno, Makoto Sugiura, Shiro Kusumoto, Yoshikazu Yamaguchi, Tsutomu Shimokawa

Proceedings Volume 6923, 69230H (2008) https://doi.org/10.1117/12.772403

KEYWORDS: Double patterning technology, Critical dimension metrology, Lithography, Optical lithography, Photoresist processing, Immersion lithography, Scanning electron microscopy, Semiconducting wafers, Water, Etching

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years